熔石英亚表面缺陷的蚀刻和热处理研究
文献类型：学位论文
| 作者 | 杨俊 |
| 学位类别 | 硕士 |
| 答辩日期 | 2014 |
| 授予单位 | 中国科学院上海光学精密机械研究所 |
| 导师 | 邵建达 |
| 关键词 | 熔石英 再沉积层 蚀刻 热处理 二次离子质谱 |
| 其他题名 | Surface Structure of Fused Silica Revealed by Wet Etching and Thermal Annealing |
| 中文摘要 | 熔石英抛光引入的亚表面缺陷严重限制了其抗激光损伤能力，研究亚表面缺陷的分布规律、形成机制以及控制方法显得尤为重要。目前对亚表面缺陷研究的重点在于裂纹、划痕等亚表面机械损伤和抛光引入的表面及亚表面杂质污染，而本文关注于在亚表面缺陷的表征和杂质分析，分别从蚀刻和热处理两种实验手段展开研究： 利用原子力显微镜观察熔石英不同蚀刻时间的表面形貌，结合二次离子质谱分析，研究了熔石英的再沉积层结构和杂质分布。结果表明，熔石英表面10 nm深的再沉积层内存在大量微裂纹和杂质，经蚀刻展开形成纳米级划痕和坑点，其分布随着深度呈指数衰减。根据纳米级划痕密度、宽深比随蚀刻深度变化的规律估算杂质元素嵌入深度与抛光微裂纹分布特征的关联性表明，杂质很有可能藏匿在抛光微裂纹中。 实验发现熔石英基片经热处理后，表面出现了高密度的点状和线状凸起。利用原子力显微镜观察熔石英热处理和先蚀刻后热处理的形貌，结合二次离子质谱对热处理前后杂质深度分布的分析，探究了热处理凸起的起源。结果表明，热处理凸起是由再沉积层中的杂质向表面扩散引起的。在此基础上提出了熔石英再沉积层结构的热处理表征方法，可根据热处理点、线状凸起的密度、分布表征抛光再沉积层中纳米级微裂纹和坑点的密度、分布。 |
| 英文摘要 | Polish-induced subsurface defects of fused silica seriously limit the laser damage resistance, and study on their distribution, forming mechanism and controlling methods seems important particularly. Currently the focus of research lies in scratched, Cracks and polish-induced absorbing impurities. This article focuses on subsurface defects of fused silica characterized in nanoscale and distribution of impurities. We have carried out two experimenal reseaches, wet etching and thermal annealing in the following respects: The structure of fused silica redeposition layer and distribution of impurities are studied by atomic force microscopy to observe surface morphology of fused silica at different etching time and by secondary ion mass spectroscopy to obtain depth profile of impurities, respectively. The results show that high density microcracks and impurities, forming nanoscale scratches and pits after etching, exist in the 10nm deep redeposition layer of fused silica. The thickness of the redeposition layer is estimated based on the evolution of density and aspect ratio of nanoscale scratches with etching depth. The estimated results is basically consistent with the depth of embedded impurities obtained by secondary ion mass spectroscopy. Correlation between depth of embedded impurities and distribution of polishing microcracks shows that impurities are more likely to hide in polishing microcracks. Experiments showed that high density point-like and line-like bulges emerged on the surface of fused silica after annealing in an oven. To analyze the source of thermal annealing bulges , the surface morphology was studied by atomic force microscopy , and the depth profile of impurities was analyzed by secondary ion mass spectroscopy. The results showed that impurities in redeposition layer spread from subsurface to surface during annealing. Based on this phenomenon, we develop the potential of using thermal annealing as a nondestructive way to characterize surface structure. The distribution of microcracks and impurities can be revealed by annealing buleges. |
| 语种 | 中文 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/16841]  |
| 专题 | 上海光学精密机械研究所_学位论文 |
| 推荐引用方式 GB/T 7714 | 杨俊. 熔石英亚表面缺陷的蚀刻和热处理研究[D]. 中国科学院上海光学精密机械研究所. 2014. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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