光学元件介质膜缺陷点筛查技术研究
文献类型：学位论文
| 作者 | 梁龙 |
| 学位类别 | 硕士 |
| 答辩日期 | 2014 |
| 授予单位 | 中国科学院上海光学精密机械研究所 |
| 导师 | 李学春 |
| 关键词 | 激光损伤，算法识别，辐射标定，缺陷筛查 |
| 其他题名 | Research on dielectric film defect screening technology |
| 中文摘要 | 随着大型激光驱动器的发展，激光传输能量越来越高，目前大口径光学元件的损伤阈值是制约高功率激光系统发展和应用的关键因素之一。光学元件介质膜存在的缺陷点在激光照射下形成损伤点，部分损伤点在激光辐照下会发生损伤增长，并且损伤点引起的光场调制会破坏后续光路中的光学元件。光学元件介质膜缺陷点筛查技术就是在元件使用之前对其进行缺陷点筛查与定位，它对于刚刚兴起的超短脉冲修复技术是十分必要的。本文围绕光学元件损伤检测和介质膜缺陷筛查展开，目的都是为了更加快捷准确的检测到光学元件的瑕疵，以便通过合理的手段改善其抗损伤性能，减少系统维护成本。本文内容包括： 1.结合线扫描位相差分成像和暗场成像技术实现损伤点图像提取，提出了双三次插值算法应用于损伤检测，有效提升了损伤检测的分辨能力，将50微米的分辨能力提升至近30微米。进一步开展了辐射标定的实验研究，建立了光学元件损伤点大小和损伤图像对应点灰度响应之间的关系；定标后通过灰度计算可实现亚像素级别的损伤点尺度的检测，误差小于±25%。 2.提出光学元件表面缺陷筛查方案，考查了符合缺陷点筛查精度需求的二维位移台单元和自动对焦单元的关键参数，并完成单元技术的集成；在现有装置上测试了熔石英的损伤阈值；阐述等离子体闪光法产生机制，缺陷筛查过程中出现等离子体溅射，形成闪光，利用PIN管及数据采集卡组成一个筛查记录装置，实现缺陷点快速定位。 关键词：激光损伤，算法识别，辐射标定，缺陷筛查 |
| 英文摘要 | With the development of laser driver, laser transmission energy is more and more higher, the large-aperture optical components damage threshold is one of the key factors to limit high power laser system development. Defects on dielectric film formed damage points under laser irradiation, part of the damage point may continue to grow under the laser irradiation, it will cause light field modulation that may destroy the subsequent optical components.Dielectric film defect screening technology is a method to identify and locate defect point before optical components use in high power laser driver, it is necessary for ultrashort pulse mitigation technology. This paper focuses on optical components damage detection and dielectric film screening, the purpose is to detect defect more quickly and accurately, improve its resistance to laser irradiation and reduce system maintenance costs. The research results are summarized as follows: 1.Combined with line-scan imaging technology and dark-field illumination technology realize image acquisition，bicubic interpolation algorithm was proposed to detect damage site on dark-field images,which improves the resolution from 50 microns to nearly 30 microns. Further experimental studies on radiation calibration, established a relationship between optics damage size and the integrated digital number of the corresponding site in the image; After calibration sub-pixel level damage size can be calculated from the gray level, the error is less than ± 25%. 2.A scheme of optical components surface defects screening was proposed,the key parameters including two-dimensional displacement unit and autofocus unit was studied in order to meet the defect screening accuracy,and complete unit integration; test laser induced damage threshold of fused silica in the existing device ; described plasma generation mechanism ,plasma flash occurred during the defects screening, use photoelectric detector and data acquisition card to record the screening result and realize defect point quickly location. Key words：Laser-induced damage, identify algorithm, radiometric calibration, defect screening |
| 语种 | 中文 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/16869]  |
| 专题 | 上海光学精密机械研究所_学位论文 |
| 推荐引用方式 GB/T 7714 | 梁龙. 光学元件介质膜缺陷点筛查技术研究[D]. 中国科学院上海光学精密机械研究所. 2014. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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