应用于高功率激光器SiO2减反膜化学改性研究
文献类型：学位论文
| 作者 | 沈斌 |
| 学位类别 | 硕士 |
| 答辩日期 | 2015 |
| 授予单位 | 中国科学院上海光学精密机械研究所 |
| 导师 | 唐永兴 |
| 关键词 | 溶胶凝胶 减反膜 稳定性 热处理 疏水性 |
| 其他题名 | Chemical Modified SiO2 Antireflective Films for High Power Laser Systems |
| 中文摘要 | 溶胶凝胶化学膜是高功率激光器中一个重要的技术组成，本文主要通过胶体溶液的配比、溶胶和涂膜工艺改进及膜层热处理工艺研究二氧化硅减反膜的稳定性。 论文第一章论述了溶胶凝胶技术原理与应用，该技术制备薄膜的主要工艺方法及特点。介绍了溶胶凝胶化学膜在高功率激光装置的使用状况，并介绍了国内外对溶胶凝胶技术的研究进展。 论文第二章研究含水量与悬胶体粒径尺寸大小之间的规律性，粒径大小对于溶胶及膜层的性能影响。通过开展溶胶及膜层性能测试分析结果表明制备获得的多孔性SiO2 减反膜透过率均高于99.5% ， 激光破坏阈值均大于60J/cm2(1064nm,15ns)，发现粒径小的SiO2 减反膜光性能最好，透过率达到99.75%，激光破坏阈值高达77.42J/cm2(1064nm,15ns)。随着水酯摩尔比值增大，悬胶体溶液平均粒径增大，当水酯摩尔比值大于3.5 时粒径增大幅度加快；粒径在10nm 以下的溶胶具有优异的稳定性，溶胶颗粒大小、粘度等性能基本保持 不变。在不同相对湿度环境下研究不同粒径膜层的稳定性发现化学膜适合在相对湿度低的环境下使用。 论文第三章研究了在方形基片上旋涂法涂制疏水减反膜及其工艺改进。由改性溶胶制备获得的疏水减反膜能够起到防潮减反的效果，性能优良且稳定。在室温40%相对湿度下和超过90%相对湿度环境下的膜层透过率分别达到99.5%和99%，接触角分别达到136o和139o。通过设计一个“类铜钱”的金属夹具，减小了旋涂法边缘效应对方形基片膜层质量的影响，提升了膜层均匀性。该工艺的研究为解决KDP 晶体运用单面旋涂法涂制两面不同膜厚均匀减反膜提供了一个可行的技术途径。 论文第四章初步研究了热处理工艺对于二氧化硅减反膜的影响，分别进行200℃和800℃马弗炉热处理，经过800℃热处理的膜层透过率曲线向短波方向移动，两者透过率峰值波长相差近210nm，但透过率峰值均超过99.8%，膜层的折射率没有变化使其光学性能优良。200℃热处理的膜层在不同相对湿度环境下透过率均大于99.9%，膜层峰值波长在高的相对湿度环境中减小约150nm；800℃热处理的膜层在高的相对湿度环境下透过率下降0.3%，膜层峰值波长基本保持在600nm。 |
| 英文摘要 | Sol gel coating is an important technology in high power laser systems, this dissertation mainly researched on the stability of silica films which included the ratio of colloidal solution, the improvement of sol and coating process, the process of film heat treatment. The first chapter reviewed the basic principle and application of sol gel technique, the process and characteristic of the method for preparing films. The status of sol gel chemical film in high power laser systems and research progress of this technology at home and abroad were introduced. In the second chapter, the regularity of colloidal suspension particle sizes prepared by different water content and the properties of the solutions and coatings affected by particle sizes were studied. The results showed that transmittance of porous silica antireflective films were more than 99.5% and LIDTs were more than 60J/cm2(1064nm,15ns), the transmittance and LIDTs of smaller particle size silica antireflective film respectively reached 99.75% and 77.42J/cm2(1064nm,15ns). The average particle sizes of colloidal suspensions increased with the ratio of H2O:TEOS, the particle size quickly increased when the H2O:TEOS ratio was larger than 3.5.The solution of particle size bellowing smaller than 10nm had excellent stability, particle size and viscosity of the solution almost unchanged. The films were suitable for low humidity environment after researching the stability of different particle size films in different humidity environments. In the third chapter, it was studied that the hydrophobic antireflective films were coated on square substrates by spinning method, and the improvement of spin coating process was also discussed. The performances of modified hydrophobic antireflective films were good and stable. The transmittance of the coating substrates at room temperature and the condition of the more than 90% relative humidity were 99.5% and 99%, the contact angles of coating with water reached 136°and 139°,respectively. We designed “a metal jig like coin”, the spinning edge effect on square substrates was improved. This research will be a feasible technical approach to one surface coating especially useful for antireflective coating on KDP crystal. In the fourth chapter, it was studied that the silica antireflective films were effected by the heat treatment processing. The silica antireflective films heat treated at 200℃ and 800℃ in muffle burner, the film transmittance curve moved to short wavelength direction about 210nm, but both the transmittance peaks were more than 99.8%. Therefore, the film optical properties were excellent and the film refractive index did not change. The transmittance of the films heat treated at 200 ℃ in different humidity environments were more than 99.9% and the film transmittance peak wavelength decreased about 150nm; the transmittance of the films heat treated at 800 ℃ in high humidity environment reduced 0.3% and the film transmittance peak wavelength maintained at 600nm. |
| 语种 | 中文 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/16949]  |
| 专题 | 上海光学精密机械研究所_学位论文 |
| 推荐引用方式 GB/T 7714 | 沈斌. 应用于高功率激光器SiO2减反膜化学改性研究[D]. 中国科学院上海光学精密机械研究所. 2015. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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