高功率激光装置组件清洗工艺及检测技术研究
文献类型：学位论文
| 作者 | 胡哲 |
| 学位类别 | 硕士 |
| 答辩日期 | 2016 |
| 授予单位 | 中国科学院上海光学精密机械研究所 |
| 导师 | 刘志刚 |
| 关键词 | 高功率激光装置 污染物 洁净清洗 接触角 色谱质谱 |
| 其他题名 | Research on cleaning process and detection technology of high power laser system assembly |
| 中文摘要 | 高功率激光装置的洁净是一个系统性的工程，贯穿装置各组件的设计、加工到运输、清洗、安装调教和正式运行等各个阶段，是实现惯性约束核聚变ICF装置高通量、高负载运行的基本保证，其中洁净清洗是洁净控制的重要一环，洁净清洗的效果要达到MIL-STD-1246C标准要求，作为检验清洗工艺是否达标的洁净度检测方法和根据检测结果来进行洁净清洗工艺参数选择是高功率激光装置洁净领域关注的重点问题。目前传统的洁净检测方法在实际操作中繁冗耗时且存在一定误差，便捷快速精确的常态化洁净检测方案和利用检测结果来进行清洗工艺参数的选择及改进在工程实践中显得尤为必要。 本文结合国内外研究现状和工程实践，对高功率激光装置的常态化洁净检测方案和洁净清洗工艺参数选择进行了实验研究，主要从以下几个方面展开研究工作： 1.针对高功率激光装置的污染物（颗粒污染物和有机化合物）和对应洁净清洗工艺及洁净度标准做了归纳总结，系统分析各类颗粒物洁净检测方法，利用擦拭显微成像法对神光装置片状放大器清洗各工序的颗粒物洁净度做了检测实验探究，实验结果表明新确定的洁净流程及检测手段能满足系统要求。 2.针对有机化合物污染物的洁净检测方面，从固体表面润湿理论出发总结了传统水膜破裂法的局限性，并提出了便捷快速的接触角测量检测法，通过实验分析了洁净清洗工艺中具体参数因素对工件表面接触角大小的影响（粗糙度、清洗剂选择、烘干工艺的环境&温度&时间）。 3. 在清洗剂对洁净检测影响方面，针对“洁净清洗烘干工艺导致接触角升高”这一现象通过“多次洁净清洗烘干实验”进行判定，利用色谱-质谱仪进行实验分析，根据NP-40（清洗剂Brulin 815GD的标定成分）的浓度残留量和总杂质浓度含量的洁净清洗各阶段变化情况得出“清洗剂在超声波清洗漂洗后有残留，所测得的接触角为清洗剂残留膜层接触角”这一结论，并通过“清洗剂膜层实验”验证了这一结论。 |
| 英文摘要 | Cleanliness control of High Power Laser System is a system engineering,which run through the entire stages of HPLS such as design of all components, processing, transportation, cleaning, tuning and operation etc, is the key to the realization of ICF devices running in high fluence and large output power. And cleaning is an important part of cleanliness control, the result of cleaning should achieve MIL-STD-1246C standard, and the clean detection method that is a test of whether the cleaning process achieve MIL-STD-1246C standard and the determination of cleaning process parameters according to test results are the focuses of HPLS cleaning. Traditional detection methods in practice which is complicated and time-consuming have some certain errors, one kind of normalization cleanliness testing program which is fast and accurate and the determination of cleaning process parameters according to test results in engineering practice are particularly necessary. Combined with domestic and foreign research status and engineering practice, this article make some research on normalization clean program and determination of cleaning process parameters of HPLS, and researches have been carried out on the following aspects: 1. Contaminants (particulate contaminants & organic compounds) of HPLS, the corresponding cleaning process and cleanliness standard are made a presentation and summary, some studies on the method of detecting particulate contaminants (wipe microscopic imaging method) are conducted, and improvement points are done. 2. In the perspective of detection of organic compounds, the limitations of traditional water film rupture method based on the theory of solid surface wetting are made a summary, and contact angle measurement which is fast and convenient is proposed, the impact of the specific factors of cleaning process influence on the size of surface contact angle is conducted. 3. In the perspective of abluent effect on cleaning detection, analysis that the phenomenon that cleaning and drying process results in increased contact angle using multiple clean washing and drying experiment is made a presentation, according to analysis of gc-ms experiment, the conclusion that cleaner is left over the ultrasonic cleaning& rinsing procedure and the measured contact angle shoulde be from the cleaning agent residues film, based on the changes of NP-40 residue amout and total impurities amout in every cleaning procedure, is conducted, then this conclusion through the film experiment is verified. |
| 语种 | 中文 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/16972]  |
| 专题 | 上海光学精密机械研究所_学位论文 |
| 推荐引用方式 GB/T 7714 | 胡哲. 高功率激光装置组件清洗工艺及检测技术研究[D]. 中国科学院上海光学精密机械研究所. 2016. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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