三倍频氧化物薄膜关键工艺研究
文献类型：学位论文
| 作者 | 涂飞飞 |
| 学位类别 | 硕士 |
| 答辩日期 | 2016 |
| 授予单位 | 中国科学院上海光学精密机械研究所 |
| 导师 | 张伟丽 |
| 关键词 | 三倍频薄膜 紫外激光 缺陷 弱吸收 |
| 其他题名 | Key technology research for oxide coatings at 355nm |
| 中文摘要 | 高性能光学薄膜是激光系统中非常重要的光学元件，它们是限制激光系统向高功率、大能量方向发展的主要瓶颈之一。为了进一步提高光学薄膜的性能，以适应高功率激光系统的发展，开展高性能激光薄膜制备工艺及其相关性能的研究具有重要的科学意义和应用价值。本文围绕提高三倍频激光薄膜抗损伤性能这一主题，在实验室已有研究基础上，针对特定氧化物薄膜，研究提高其损伤性能的关键工艺。 首先采用电子束蒸发技术在不同基底上制备了Al2O3/SiO2高反膜，通过分析高反膜在355nm纳秒激光辐照下的损伤特性以及损伤破坏过程，理清引起损伤的主要缺陷类型及缺陷密度，为后续关键工艺研究指明方向。 针对氧化铝薄膜失氧引起的非化学计量比吸收，研究了不同退火条件对Al2O3单层膜光学常数、化学组份以及损伤阈值的影响。研究结果表明，薄膜沉积完成后原位进行真空室有氧退火相比传统空气退火可以有效提高氧化铝单层膜氧化程度，避免空气退火时引入的水以及杂质等吸附，得到的氧化铝单层膜损伤阈值较高。对Al2O3/SiO2高反膜进行真空室有氧退火，解决了高反膜在空气退火时出现膜裂的问题，所制备的高反膜损伤阈值达到17.6J/cm2 (355nm, 8ns)，相比未退火高反膜样品有所提高。 以金属铝代替氧化铝为初始蒸发源材料，采用电子束反应蒸发制备了Al2O3单层膜，研究了不同沉积速率和氧分压对氧化铝单层膜光学性能以及抗损伤性能的影响。通过工艺优化，可以获得最佳的弱吸收氧化铝单层膜沉积工艺。根据基片和单层膜的透反射率光谱曲线拟合得到反应蒸发技术研制的氧化铝单层膜的折射率，为后续反射膜膜系设计及制备奠定基础。 在电子束反应蒸发金属铝制备氧化铝薄膜工艺的基础上，设计制备了反射率95%的Al2O3/AlF3 高反膜，并与常规Al2O3/AlF3高反膜的光学性质、损伤阈值、损伤形貌以及深度进行了对比分析。实验表明，采用金属铝代替氧化铝作为蒸发源材料制备Al2O3/AlF3高反膜可以有效降低薄膜内节瘤缺陷密度，获得更高的损伤阈值。 |
| 英文摘要 | High performance mirrors and polarizers are essential optical components in laser systems. The development of laser system towards higher power and energy havs been limited by the performance of the coatings. To improve the performance of optical coatings, it is meaningful to both academic and engineering application to research the deposition process of high performance coatings so that they can meet the requirements of high-power laser systems. In order to improve damage threshold of the coatings, our research concern on the key technique of the preparation of the coatings, especially for the oxide film materials. High-reflective (HR) coatings of Al2O3/SiO2 were prepared on different substrates by electron beam evaporation. Through the analysis of the high reflection films damage performance under 355 nm nanosecond laser irradiation, we sort out the main types of defects and provide the direction for the follow-up study of the key technology. The effects of different annealing conditions on the optical, chemical composition and damage threshold of Al2O3 monolayer films were studied as the non-stoichiometric absorption of the oxide coatings. The results show that compared to traditional air annealing, annealing in vacuum chamber after deposition with oxygen can effectively improve the degree of oxidation of alumina coatings, avoid water and impurities introduced during air annealing and increase damage threshold of alumina monolayer films. The Al2O3/SiO2 HR coatings were annealed in vacuum chamber, which solved the problem of film crack while annealed in air. The damage threshold of HR coatings reached as high as 17.6J/cm2 (355nm, 8ns). Al2O3 monolayers were prepared by reactive electron beam evaporation system by aluminum metal instead of alumina for initial evaporation source material. Alumina monolayer properties and damage resistance property were studied with different deposition rate and oxygen partial pressure. Based on the preparation technology of alumina thin film by reactive electron beam evaporation, Al2O3/AlF3 HR coatings(R>95%) were designed and prepared. The optical properties, damage threshold and damage morphology of Al2O3/AlF3 HR coatings were discussed compared with the samples prepared by alumina initial materials. The experimental results show that the technology can effectively reduce the defect density of Al2O3/AlF3 HR coatings and obtain a higher laser-induced damage threshold. |
| 语种 | 中文 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/16986]  |
| 专题 | 上海光学精密机械研究所_学位论文 |
| 推荐引用方式 GB/T 7714 | 涂飞飞. 三倍频氧化物薄膜关键工艺研究[D]. 中国科学院上海光学精密机械研究所. 2016. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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