Preparation of high laser-induced damage threshold Ta2O5 films
文献类型:期刊论文
作者 | Xu, Cheng; Yi, Peng; Fan, Heliang; Qi, Jianwei; Yang, Shuai; Qiang, Yinghuai; Liu, Jiongtian; Li, Dawei |
刊名 | appl. surf. sci.
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出版日期 | 2014 |
卷号 | 309页码:194 |
关键词 | Laser damage Ta2O5 films Absorption Defects |
通讯作者 | xu, c (reprint author), china univ min & technol, sch mat sci & engn, xuzhou 221116, peoples r china. |
英文摘要 | high laser-induced damage threshold (lidt)ta2o5 films were prepared by the sol-gel method using tacl5 as a new precursor. the optical properties, surface morphologies, chemical composition, absorption and lidt of the films were investigated. the results showed that the transparent and homogenous ta2o5 films had small surface roughness, low absorption and high lidt even with large number of layers. the maximum lidt at 1064 nm and 12 ns of the films was 24.8 j/cm(2). the ion chromatograph and fourier transform infrared spectrum were used to reveal the functions of the addition of h2o2 in the sol formation. it was shown that h2o2 had two important functions, which were the decrease of cl element content and the rapid generation of tantalum oxide. the high lidt achieved was mainly due to the nearly free of defects in the films. (c) 2014 elsevier b.v. all rights reserved. |
收录类别 | SCI |
语种 | 英语 |
版本 | 出版稿 |
源URL | [http://ir.siom.ac.cn/handle/181231/13021] ![]() |
专题 | 上海光学精密机械研究所_中科院强激光材料重点实验室 |
作者单位 | 1.[Xu, Cheng 2.Yi, Peng 3.Fan, Heliang 4.Qi, Jianwei 5.Yang, Shuai 6.Qiang, Yinghuai 7.Liu, Jiongtian] China Univ Min & Technol, Sch Mat Sci & Engn, Xuzhou 221116, Peoples R China 8.[Li, Dawei] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab High Power La |
推荐引用方式 GB/T 7714 | Xu, Cheng,Yi, Peng,Fan, Heliang,et al. Preparation of high laser-induced damage threshold Ta2O5 films[J]. appl. surf. sci.,2014,309:194. |
APA | Xu, Cheng.,Yi, Peng.,Fan, Heliang.,Qi, Jianwei.,Yang, Shuai.,...&Li, Dawei.(2014).Preparation of high laser-induced damage threshold Ta2O5 films.appl. surf. sci.,309,194. |
MLA | Xu, Cheng,et al."Preparation of high laser-induced damage threshold Ta2O5 films".appl. surf. sci. 309(2014):194. |
入库方式: OAI收割
来源:上海光学精密机械研究所
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