Nanosecond laser-induced damage at different initial temperatures of Ta2O5 films prepared by dual ion beam sputtering
文献类型：期刊论文
| 作者 | Xu, Cheng; Jia, Jiaojiao; Yang, Di; Fan, Heliang; Qiang, Yinghuai; Liu, Jiongtian; Hu, Guohang; Li, Dawei |
| 刊名 | j. appl. phys.
 |
| 出版日期 | 2014 |
| 卷号 | 116期号:5页码:53102 |
| 关键词 | ELECTRONIC-STRUCTURE OXIDE-FILMS THRESHOLD ABSORPTION COATINGS DEPOSITION STABILITY VACUUM |
| 通讯作者 | xu, c (reprint author), china univ min & technol, sch mat sci & engn, xuzhou 221116, peoples r china. |
| 英文摘要 | ta2o5 films were deposited by dual ion beam sputtering method. the nanosecond laser-induced damage threshold (lidt) at different initial temperatures and time of the films was investigated by an in situ high temperature laser-induced damage testing platform. it was shown that, when the initial temperature increased from 298k to 383 k, the lidt at 1064 nm and 12 ns significantly decreased by nearly 14%. then the lidt at 1064 nm and 12 ns decreased slower with the same temperature increment. different damage morphologies were found at different initial temperatures. at low initial temperatures, it was the defects-isolated damage while at high initial temperatures it was the defects-combined damage. the theoretical calculations based on the defect-induced damage model revealed that both the significant increase of the highest temperature and the duration contributed to the different damage morphologies. with the initial temperature being increased, the thermal-stress coupling damage mechanism transformed gradually to the thermal dominant damage mechanism. (c) 2014 aip publishing llc. |
| 收录类别 | SCI |
| 语种 | 英语 |
| 版本 | 出版稿 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/13111]  |
| 专题 | 上海光学精密机械研究所_中科院强激光材料重点实验室 |
| 作者单位 | 1.[Xu, Cheng 2.Jia, Jiaojiao 3.Fan, Heliang 4.Qiang, Yinghuai 5.Liu, Jiongtian] China Univ Min & Technol, Sch Mat Sci & Engn, Xuzhou 221116, Peoples R China 6.[Yang, Di] Minzu Univ China, Coll Sci, Beijing 10081, Peoples R China 7.[Hu, Guohang 8.Li, Dawei] Chinese |
| 推荐引用方式 GB/T 7714 | Xu, Cheng,Jia, Jiaojiao,Yang, Di,et al. Nanosecond laser-induced damage at different initial temperatures of Ta2O5 films prepared by dual ion beam sputtering[J]. j. appl. phys.,2014,116(5):53102. |
| APA | Xu, Cheng.,Jia, Jiaojiao.,Yang, Di.,Fan, Heliang.,Qiang, Yinghuai.,...&Li, Dawei.(2014).Nanosecond laser-induced damage at different initial temperatures of Ta2O5 films prepared by dual ion beam sputtering.j. appl. phys.,116(5),53102. |
| MLA | Xu, Cheng,et al."Nanosecond laser-induced damage at different initial temperatures of Ta2O5 films prepared by dual ion beam sputtering".j. appl. phys. 116.5(2014):53102. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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