Study on the relationship between laser-induced damage threshold and microscopic properties of Ta2O5 films by the combination of experiment and simulation
文献类型：期刊论文
| 作者 | Xu, Cheng; Ma, Ming; Sun, Huanhuan; Lin, Di; Feng, Peizhong; Qi, Jianwei; Qiang, Yinghuai; Li, Dawei; Tao, Chunxian |
| 刊名 | optoelectron. adv. mater.-rapid commun.
 |
| 出版日期 | 2015 |
| 卷号 | 9期号:42686页码:1337 |
| 通讯作者 | xu, c (reprint author), china univ min & technol, sch mat sci & engn, xuzhou 221116, peoples r china. |
| 英文摘要 | ta2o5 films were prepared by electron beam evaporation under different oxygen partial pressures. three ta2o5 models were constructed according to the experimental obtained o/ta ratios to calculate the microscopic properties. it was shown that the oxygen vacancy significantly decreased the microscopic band gaps, which was due to the generation of a defect level in the energy gap formed by 5d state of tantalum. the lidt shared the same trend with the microscopic band gaps. with the increase of the o/ta ratios from 2.44 and 2.47 to 2.50, the lidt increased by 62.2% and 54.7%, whereas the microscopic band gaps increased by 268% and 160%, respectively, compared to the initial value. |
| 收录类别 | SCI |
| 语种 | 英语 |
| 版本 | 出版稿 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/13830]  |
| 专题 | 上海光学精密机械研究所_中科院强激光材料重点实验室 |
| 作者单位 | 1.[Xu, Cheng 2.Ma, Ming 3.Sun, Huanhuan 4.Lin, Di 5.Feng, Peizhong 6.Qi, Jianwei 7.Qiang, Yinghuai] China Univ Min & Technol, Sch Mat Sci & Engn, Xuzhou 221116, Peoples R China 8.[Li, Dawei 9.Tao, Chunxian] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab High Power Laser Mat, Shanghai 201800, Peoples R China 10.Univ Shanghai Sci & Technol, Sch Opt Elect & Comp Engn, Shanghai 200093, Peoples R China |
| 推荐引用方式 GB/T 7714 | Xu, Cheng,Ma, Ming,Sun, Huanhuan,et al. Study on the relationship between laser-induced damage threshold and microscopic properties of Ta2O5 films by the combination of experiment and simulation[J]. optoelectron. adv. mater.-rapid commun.,2015,9(42686):1337. |
| APA | Xu, Cheng.,Ma, Ming.,Sun, Huanhuan.,Lin, Di.,Feng, Peizhong.,...&Tao, Chunxian.(2015).Study on the relationship between laser-induced damage threshold and microscopic properties of Ta2O5 films by the combination of experiment and simulation.optoelectron. adv. mater.-rapid commun.,9(42686),1337. |
| MLA | Xu, Cheng,et al."Study on the relationship between laser-induced damage threshold and microscopic properties of Ta2O5 films by the combination of experiment and simulation".optoelectron. adv. mater.-rapid commun. 9.42686(2015):1337. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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