Beam modulation caused by the plasma scalds in the multilayer dielectric films
文献类型:期刊论文
作者 | Wang, Hu; Qi, Hongji; Guo, Meng; Chai, Yingjie; Wang, Bin; Yi, Kui; Shao, Jianda |
刊名 | opt. lett.
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出版日期 | 2015 |
卷号 | 40期号:12页码:2925 |
通讯作者 | qi, hj (reprint author), shanghai inst opt & fine mech, key lab mat high power laser, 390 qinghe rd, shanghai 201800, peoples r china. |
英文摘要 | the near-field phase modulation (nfpm) caused by the plasma scalds is investigated with a newly proposed mixed overcoat layer model. based on the nfpm, the far-field intensity modulation (ffim) is calculated and discussed with the scalar diffraction theory. the results indicate that both the nfpm and ffim are sensitive to the scalding depth. a feature curve is developed to analyze the nfpm for arbitrary scalding depth. the modulation can be ignored when the scalding depth is less than the first feature point in the feature curve. even though the diffraction intensity in the fresnel region can be enhanced dozens of times, the ffim in the fraunhofer region can recover gradually if the scalding depth is below a critical value. the preliminary experimental results are consistent with the theoretical prediction. (c) 2015 optical society of america |
收录类别 | SCI |
语种 | 英语 |
版本 | 出版稿 |
源URL | [http://ir.siom.ac.cn/handle/181231/14280] ![]() |
专题 | 上海光学精密机械研究所_中科院强激光材料重点实验室 |
作者单位 | 1.[Wang, Hu 2.Qi, Hongji 3.Guo, Meng 4.Chai, Yingjie 5.Wang, Bin 6.Yi, Kui 7.Shao, Jianda] Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Shanghai 201800, Peoples R China 8.[Wang, Hu 9.Guo, Meng 10.Chai, Yingjie |
推荐引用方式 GB/T 7714 | Wang, Hu,Qi, Hongji,Guo, Meng,et al. Beam modulation caused by the plasma scalds in the multilayer dielectric films[J]. opt. lett.,2015,40(12):2925. |
APA | Wang, Hu.,Qi, Hongji.,Guo, Meng.,Chai, Yingjie.,Wang, Bin.,...&Shao, Jianda.(2015).Beam modulation caused by the plasma scalds in the multilayer dielectric films.opt. lett.,40(12),2925. |
MLA | Wang, Hu,et al."Beam modulation caused by the plasma scalds in the multilayer dielectric films".opt. lett. 40.12(2015):2925. |
入库方式: OAI收割
来源:上海光学精密机械研究所
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