中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Beam modulation caused by the plasma scalds in the multilayer dielectric films

文献类型:期刊论文

作者Wang, Hu; Qi, Hongji; Guo, Meng; Chai, Yingjie; Wang, Bin; Yi, Kui; Shao, Jianda
刊名opt. lett.
出版日期2015
卷号40期号:12页码:2925
通讯作者qi, hj (reprint author), shanghai inst opt & fine mech, key lab mat high power laser, 390 qinghe rd, shanghai 201800, peoples r china.
英文摘要the near-field phase modulation (nfpm) caused by the plasma scalds is investigated with a newly proposed mixed overcoat layer model. based on the nfpm, the far-field intensity modulation (ffim) is calculated and discussed with the scalar diffraction theory. the results indicate that both the nfpm and ffim are sensitive to the scalding depth. a feature curve is developed to analyze the nfpm for arbitrary scalding depth. the modulation can be ignored when the scalding depth is less than the first feature point in the feature curve. even though the diffraction intensity in the fresnel region can be enhanced dozens of times, the ffim in the fraunhofer region can recover gradually if the scalding depth is below a critical value. the preliminary experimental results are consistent with the theoretical prediction. (c) 2015 optical society of america
收录类别SCI
语种英语
版本出版稿
源URL[http://ir.siom.ac.cn/handle/181231/14280]  
专题上海光学精密机械研究所_中科院强激光材料重点实验室
作者单位1.[Wang, Hu
2.Qi, Hongji
3.Guo, Meng
4.Chai, Yingjie
5.Wang, Bin
6.Yi, Kui
7.Shao, Jianda] Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Shanghai 201800, Peoples R China
8.[Wang, Hu
9.Guo, Meng
10.Chai, Yingjie
推荐引用方式
GB/T 7714
Wang, Hu,Qi, Hongji,Guo, Meng,et al. Beam modulation caused by the plasma scalds in the multilayer dielectric films[J]. opt. lett.,2015,40(12):2925.
APA Wang, Hu.,Qi, Hongji.,Guo, Meng.,Chai, Yingjie.,Wang, Bin.,...&Shao, Jianda.(2015).Beam modulation caused by the plasma scalds in the multilayer dielectric films.opt. lett.,40(12),2925.
MLA Wang, Hu,et al."Beam modulation caused by the plasma scalds in the multilayer dielectric films".opt. lett. 40.12(2015):2925.

入库方式: OAI收割

来源:上海光学精密机械研究所

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