Influence of deposition rate on interface width of Mo/Si multilayers
文献类型：期刊论文
| 作者 | Zhao, Jiaoling; Yi, Kui; Wang, Hu; Fang, Ming; Wang, Bin; Hu, Guohang; He, Hongbo |
| 刊名 | thin solid films
 |
| 出版日期 | 2015 |
| 卷号 | 592页码:256 |
| 通讯作者 | he, hb (reprint author), chinese acad sci, shanghai inst opt & fine mech siom, key lab mat high power laser, shanghai 201800, peoples r china. |
| 英文摘要 | the application of high-reflectance mo/si multilayers in extreme ultraviolet (euv) lithography does not only require high normal-incidence reflectivity but also long lifetime. in this paper, the microstructure of multilayers has been studied by means of x-ray reflectivity, x-ray diffraction, atomic force microscopy, and transmission electron microscopy. the interface width of mo/si multilayers is strongly influenced by the deposition rate. the interface width increases with the deposition rate. thereafter the reflectivity decreases and bandwidth narrows down. lower deposition rate is required to fabricate high quality mo/si multilayers according to our results. our findings are beneficial to improve the reflectivity of mo/si multilayer mirrors by reducing the interface width with proper deposition rate. (c) 2015 elsevier b.v. all rights reserved. |
| 收录类别 | SCI |
| 语种 | 英语 |
| 版本 | 出版稿 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/14307]  |
| 专题 | 上海光学精密机械研究所_中科院强激光材料重点实验室 |
| 作者单位 | 1.[Zhao, Jiaoling 2.Yi, Kui 3.Wang, Hu 4.Fang, Ming 5.Wang, Bin 6.Hu, Guohang 7.He, Hongbo] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech SIOM, Key Lab Mat High Power Laser, Shanghai 201800, Peoples R China 8.[Zhao, Jiaoling 9.Wang, Hu 10.Wang, Bin] Univ Chinese Acad Sci, Beijing 100049, Peoples R China |
| 推荐引用方式 GB/T 7714 | Zhao, Jiaoling,Yi, Kui,Wang, Hu,et al. Influence of deposition rate on interface width of Mo/Si multilayers[J]. thin solid films,2015,592:256. |
| APA | Zhao, Jiaoling.,Yi, Kui.,Wang, Hu.,Fang, Ming.,Wang, Bin.,...&He, Hongbo.(2015).Influence of deposition rate on interface width of Mo/Si multilayers.thin solid films,592,256. |
| MLA | Zhao, Jiaoling,et al."Influence of deposition rate on interface width of Mo/Si multilayers".thin solid films 592(2015):256. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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