Investigations on the catastrophic damage in multilayer dielectric films
文献类型：期刊论文
| 作者 | Liu, Xiaofeng; Zhao, Yuan'an; Gao, Yanqi; Li, Dawei; Hu, Guohang; Zhu, Meiping; Fan, Zhengxiu; Shao, Jianda |
| 刊名 | appl. optics
 |
| 出版日期 | 2013 |
| 卷号 | 52期号:10页码:2194 |
| 通讯作者 | zhao, ya (reprint author), shanghai inst opt & fine mech, key lab high power laser mat, shanghai 201800, peoples r china. |
| 英文摘要 | hfo2/sio2 coatings are always fluence-limited by a class of rare catastrophic failures induced by a nanosecond laser with a wavelength of 1053 nm. the catastrophic damage in hfo2/sio2 coatings behaves as the damage growth with repeated laser irradiation, and thus eventually limits the mirror performance. understanding the damage processes and mechanisms associated with the catastrophic damage are important for reducing the occurrence of the catastrophic failure and allowing the hfo2/sio2 coatings to survive at the high fluence required by high laser systems. the rough damage behavior of the catastrophic failure at the proper critical fluence is present. the pit and delamination in the catastrophic failure are investigated to find the possible reasons leading to the catastrophic failure. the experimental results indicate that nodular defect originated from the substrate easily incurs the catastrophic damage. the electric field enhancements of the pit and the substrate impurities may contribute to this phenomenon. the delamination is always present on the left of the pit when laser irradiates from left to right at oblique incidence, which may be related to the plasma plume toward the laser incidence. (c) 2013 optical society of america |
| 收录类别 | SCI |
| 语种 | 英语 |
| 版本 | 出版稿 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/14667]  |
| 专题 | 上海光学精密机械研究所_中科院强激光材料重点实验室 |
| 作者单位 | 1.[Liu, Xiaofeng 2.Zhao, Yuan'an 3.Li, Dawei 4.Hu, Guohang 5.Zhu, Meiping 6.Fan, Zhengxiu 7.Shao, Jianda] Shanghai Inst Opt & Fine Mech, Key Lab High Power Laser Mat, Shanghai 201800, Peoples R China 8.[Gao, Yanqi] Shanghai Inst Laser Plasma, Shanghai 201800, Peoples R China |
| 推荐引用方式 GB/T 7714 | Liu, Xiaofeng,Zhao, Yuan'an,Gao, Yanqi,et al. Investigations on the catastrophic damage in multilayer dielectric films[J]. appl. optics,2013,52(10):2194. |
| APA | Liu, Xiaofeng.,Zhao, Yuan'an.,Gao, Yanqi.,Li, Dawei.,Hu, Guohang.,...&Shao, Jianda.(2013).Investigations on the catastrophic damage in multilayer dielectric films.appl. optics,52(10),2194. |
| MLA | Liu, Xiaofeng,et al."Investigations on the catastrophic damage in multilayer dielectric films".appl. optics 52.10(2013):2194. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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