Damage threshold influenced by the high absorption defect at the film-substrate interface under ultraviolet laser irradiation
文献类型：期刊论文
| 作者 | Yu, Zhenkun; He, Hongbo; Sun, Wei; Qi, Hongji; Yang, Minghong; Xiao, Qiling; Zhu, Meiping |
| 刊名 | opt. lett.
 |
| 出版日期 | 2013 |
| 卷号 | 38期号:21页码:4308 |
| 通讯作者 | he, hb (reprint author), shanghai inst opt & fine mech, key lab mat high power laser, 390 qinghe rd, shanghai, peoples r china. |
| 英文摘要 | the laser-induced damage threshold (lidt) of a single-layer coating at the nanosecond (ns) regime is obviously lower than an uncoated substrate or a high reflectivity coating coated by the same material. to elucidate this phenomenon, we demonstrate the lidt of three types of samples at 355 nm with 8 ns. high absorption defects are found at the film-substrate interface by comparing their lidts and damage morphologies. these defects originate from the substrate and appear during the coating process. simulation results show that these defects, coupled to the coating, are mainly responsible for decreasing the damage threshold. (c) 2013 optical society of america |
| 收录类别 | SCI |
| 语种 | 英语 |
| 版本 | 出版稿 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/14780]  |
| 专题 | 上海光学精密机械研究所_中科院强激光材料重点实验室 |
| 作者单位 | 1.[Yu, Zhenkun 2.He, Hongbo 3.Sun, Wei 4.Qi, Hongji 5.Yang, Minghong 6.Xiao, Qiling 7.Zhu, Meiping] Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Shanghai, Peoples R China 8.[Yu, Zhenkun 9.Sun, Wei] Chinese Acad Sci, Grad Sch, Beijing, Peoples R China |
| 推荐引用方式 GB/T 7714 | Yu, Zhenkun,He, Hongbo,Sun, Wei,et al. Damage threshold influenced by the high absorption defect at the film-substrate interface under ultraviolet laser irradiation[J]. opt. lett.,2013,38(21):4308. |
| APA | Yu, Zhenkun.,He, Hongbo.,Sun, Wei.,Qi, Hongji.,Yang, Minghong.,...&Zhu, Meiping.(2013).Damage threshold influenced by the high absorption defect at the film-substrate interface under ultraviolet laser irradiation.opt. lett.,38(21),4308. |
| MLA | Yu, Zhenkun,et al."Damage threshold influenced by the high absorption defect at the film-substrate interface under ultraviolet laser irradiation".opt. lett. 38.21(2013):4308. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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