The Effect of Deep HF Etching on the Surface Quality and Figure of Fused Silica Optics
文献类型：会议论文
| 作者 | Xu, Jiafeng; Xu, Xueke; Wei, Chaoyang; Gao, Wenlan; Yang, Minghong; Shao, Jianda; Liu, Shijie |
| 出版日期 | 2015 |
| 会议名称 | conference on optical manufacturing and testing xi |
| 通讯作者 | xu, jf (reprint author), chinese acad sci, shanghai inst opt & fine mech, key lab mat high power laser, shanghai 201800, peoples r china. |
| 英文摘要 | the effect of deep hf etching on the surface quality and figure of fused silica optics has been investigated systematically. fused silica samples (100 mm in diameter x 10 mm thick) were manufactured using the conventional grinding and polishing process. these processed samples are etched with different removal depth. initially, the surface quality of fused silica samples is characterized in terms of surface roughness and surface defects. many digs not more than 1 mu m deep are emerged which originates from the micron grinding cracks and crack pits. these digs worsened the surface roughness and frosted the sample. while submillimeter subsurface damage exposed through etching appear as sparkling dots under the high power lamp. the average total length of millimeter scratches on single surfaces is over 200 mm. not all millimeter scratches could be exposed until removal depth of up to 2 mu m. finally, the surface figure behavior during deep etching has also been figured out. etching on the edge of the upper surface of samples placed horizontally went faster than on the inside parts. the surface of samples placed vertically assumed a more complicated removal distribution, which can be both explained in terms of "fringe tip effect". for the change of surface figure pv, the initial surface figure feature plays an important role as well as the etching removal distribution. |
| 收录类别 | CPCI |
| 会议录 | optical manufacturing and testing xi
 |
| 会议录出版者 | spie-int soc optical engineering |
| 语种 | 英语 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/17059]  |
| 专题 | 上海光学精密机械研究所_中科院强激光材料重点实验室 |
| 作者单位 | 1.[Xu, Jiafeng 2.Xu, Xueke 3.Wei, Chaoyang 4.Gao, Wenlan 5.Yang, Minghong 6.Shao, Jianda 7.Liu, Shijie] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Shanghai 201800, Peoples R China 8.[Xu, Xueke 9.Gao, Wenlan] Shanghai Hengyi Opt & Fine Mech Co Ltd, Shanghai 201800, Peoples R China |
| 推荐引用方式 GB/T 7714 | Xu, Jiafeng,Xu, Xueke,Wei, Chaoyang,et al. The Effect of Deep HF Etching on the Surface Quality and Figure of Fused Silica Optics[C]. 见:conference on optical manufacturing and testing xi. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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