中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
A humidity-resistant highly sensitive holographic photopolymerizable dry film

文献类型:期刊论文

作者Gong QX ; Wang SL ; Huang MJ ; Gan FX(干福熹)
刊名mater. lett.
出版日期2005
卷号59期号:23页码:2969
关键词photopolymer holographic recording exposure sensitivity diffraction efficiency
ISSN号0167-577x
中文摘要a new humidity-resistant highly sensitive acrylamide-based photopolymeric holographic recording material has been developed. the photopolymer is resistant to the humidity of environment. diffraction efficiencies near 50% are obtained with exposure energy of 60 mj/cm(2) in materials of 150 mu m. thickness. diphenyl iodonium chloride is added to the material and can increase the exposure sensitivity by a factor of more than 4 (to about 28 mj/cm(2)). an image has been successfully stored in the material with a small distortion. (c) 2005 elsevier b.v. all rights reserved.
学科主题光存储
收录类别EI
语种英语
WOS记录号WOS:000231210000025
公开日期2009-09-22
源URL[http://ir.siom.ac.cn/handle/181231/3923]  
专题上海光学精密机械研究所_高密度光存储技术实验室
推荐引用方式
GB/T 7714
Gong QX,Wang SL,Huang MJ,et al. A humidity-resistant highly sensitive holographic photopolymerizable dry film[J]. mater. lett.,2005,59(23):2969, 2972.
APA Gong QX,Wang SL,Huang MJ,&干福熹.(2005).A humidity-resistant highly sensitive holographic photopolymerizable dry film.mater. lett.,59(23),2969.
MLA Gong QX,et al."A humidity-resistant highly sensitive holographic photopolymerizable dry film".mater. lett. 59.23(2005):2969.

入库方式: OAI收割

来源:上海光学精密机械研究所

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