A humidity-resistant highly sensitive holographic photopolymerizable dry film
文献类型：期刊论文
| 作者 | Gong QX ; Wang SL ; Huang MJ ; Gan FX(干福熹) |
| 刊名 | mater. lett.
 |
| 出版日期 | 2005 |
| 卷号 | 59期号:23页码:2969 |
| 关键词 | photopolymer holographic recording exposure sensitivity diffraction efficiency |
| ISSN号 | 0167-577x |
| 中文摘要 | a new humidity-resistant highly sensitive acrylamide-based photopolymeric holographic recording material has been developed. the photopolymer is resistant to the humidity of environment. diffraction efficiencies near 50% are obtained with exposure energy of 60 mj/cm(2) in materials of 150 mu m. thickness. diphenyl iodonium chloride is added to the material and can increase the exposure sensitivity by a factor of more than 4 (to about 28 mj/cm(2)). an image has been successfully stored in the material with a small distortion. (c) 2005 elsevier b.v. all rights reserved. |
| 学科主题 | 光存储 |
| 收录类别 | EI |
| 语种 | 英语 |
| WOS记录号 | WOS:000231210000025 |
| 公开日期 | 2009-09-22 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/3923]  |
| 专题 | 上海光学精密机械研究所_高密度光存储技术实验室 |
| 推荐引用方式 GB/T 7714 | Gong QX,Wang SL,Huang MJ,et al. A humidity-resistant highly sensitive holographic photopolymerizable dry film[J]. mater. lett.,2005,59(23):2969, 2972. |
| APA | Gong QX,Wang SL,Huang MJ,&干福熹.(2005).A humidity-resistant highly sensitive holographic photopolymerizable dry film.mater. lett.,59(23),2969. |
| MLA | Gong QX,et al."A humidity-resistant highly sensitive holographic photopolymerizable dry film".mater. lett. 59.23(2005):2969. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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