A large-area photolithography technique based on surface plasmons leakage modes
文献类型：期刊论文
| 作者 | Yuan Guanghui ; Wang Pei ; Lu Yonghua ; Cao Yong ; Zhang Douguo ; Ming Hai ; Xu WD(徐文东) |
| 刊名 | opt. commun.
 |
| 出版日期 | 2008 |
| 卷号 | 281期号:9页码:2680 |
| 关键词 | photolithography surface plasmons |
| ISSN号 | 0030-4018 |
| 中文摘要 | an atomic force microscope (afm) assisted surface plasmons leakage radiation photolithography technique has been numerically demonstrated by using two-dimensional finite-difference time-domain (2d-fdtd) method. with the aid of a metallic afm tip, particular characteristic of the kretstchmann configuration to excite surface plasmons (sps) is utilized to achieve large-area patterns with high spatial resolution and contrast, the photoresist could be exposed with low power laser due to the remarkable local field enhancement at the metal/dielectric interface and the resonant localized sps modes near the tip. good tolerance on the film thickness and incident angle has been obtained, which provides a good practicability for experiments. this photolithography technique proposed here can realize large-area, high-resolution, high-contrast, nondestructive, arbitrary-structure fabrication of nanoscale devices. (c) 2007 elsevier b.v. all rights reserved. |
| 学科主题 | 光存储 |
| 收录类别 | EI |
| 语种 | 英语 |
| WOS记录号 | WOS:000255487400054 |
| 公开日期 | 2009-09-22 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/4059]  |
| 专题 | 上海光学精密机械研究所_高密度光存储技术实验室 |
| 推荐引用方式 GB/T 7714 | Yuan Guanghui,Wang Pei,Lu Yonghua,et al. A large-area photolithography technique based on surface plasmons leakage modes[J]. opt. commun.,2008,281(9):2680, 2684. |
| APA | Yuan Guanghui.,Wang Pei.,Lu Yonghua.,Cao Yong.,Zhang Douguo.,...&徐文东.(2008).A large-area photolithography technique based on surface plasmons leakage modes.opt. commun.,281(9),2680. |
| MLA | Yuan Guanghui,et al."A large-area photolithography technique based on surface plasmons leakage modes".opt. commun. 281.9(2008):2680. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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