A novel method to reduce the period limitation in laser interference lithography
文献类型：期刊论文
| 作者 | Dai, LG ; Xuan, MD ; Ding, P ; Jiang, Y ; Ma, ZG ; Jia, HQ ; Wang, WX ; Zhou, JM ; Chen, H |
| 刊名 | OPTICAL AND QUANTUM ELECTRONICS
 |
| 出版日期 | 2015 |
| 卷号 | 47期号:7页码:2331 |
| 公开日期 | 2016-12-26 |
| 源URL | [http://ir.iphy.ac.cn/handle/311004/60835]  |
| 专题 | 物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文 |
| 推荐引用方式 GB/T 7714 | Dai, LG,Xuan, MD,Ding, P,et al. A novel method to reduce the period limitation in laser interference lithography[J]. OPTICAL AND QUANTUM ELECTRONICS,2015,47(7):2331. |
| APA | Dai, LG.,Xuan, MD.,Ding, P.,Jiang, Y.,Ma, ZG.,...&Chen, H.(2015).A novel method to reduce the period limitation in laser interference lithography.OPTICAL AND QUANTUM ELECTRONICS,47(7),2331. |
| MLA | Dai, LG,et al."A novel method to reduce the period limitation in laser interference lithography".OPTICAL AND QUANTUM ELECTRONICS 47.7(2015):2331. |
入库方式： OAI收割
来源：物理研究所
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