Enhanced electrochemical performance of Si-Cu-Ti thin films by surface covered with Cu3Si nanowires
文献类型：期刊论文
| 作者 | Xu, KQ ; He, Y ; Ben, LB ; Li, H ; Huang, XJ |
| 刊名 | JOURNAL OF POWER SOURCES
 |
| 出版日期 | 2015 |
| 卷号 | 281页码:455 |
| 公开日期 | 2016-12-26 |
| 源URL | [http://ir.iphy.ac.cn/handle/311004/61007]  |
| 专题 | 物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文 |
| 推荐引用方式 GB/T 7714 | Xu, KQ,He, Y,Ben, LB,et al. Enhanced electrochemical performance of Si-Cu-Ti thin films by surface covered with Cu3Si nanowires[J]. JOURNAL OF POWER SOURCES,2015,281:455. |
| APA | Xu, KQ,He, Y,Ben, LB,Li, H,&Huang, XJ.(2015).Enhanced electrochemical performance of Si-Cu-Ti thin films by surface covered with Cu3Si nanowires.JOURNAL OF POWER SOURCES,281,455. |
| MLA | Xu, KQ,et al."Enhanced electrochemical performance of Si-Cu-Ti thin films by surface covered with Cu3Si nanowires".JOURNAL OF POWER SOURCES 281(2015):455. |
入库方式： OAI收割
来源：物理研究所
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