Predicting multilayer film's residual stress from its monolayers
文献类型：期刊论文
| 作者 | Guo, CQ ; Pei, ZL ; Fan, D ; Liu, RD ; Gong, J ; Sun, C |
| 刊名 | MATERIALS & DESIGN
 |
| 出版日期 | 2016-11-15 |
| 卷号 | 110页码:858-864 |
| 关键词 | Residual stress Multilayer film Diamond-like carbon CrN/DLC multilayer Cathodic vacuum arc |
| ISSN号 | 0264-1275 |
| 通讯作者 | Pei, ZL ; Sun, C (reprint author), Chinese Acad Sci, Inst Met Res, Shenyang 110016, Peoples R China. |
| 学科主题 | Materials Science, Multidisciplinary |
| 收录类别 | SCI |
| 资助信息 | National Key Basic Research Program of China (973 Program) [2012CB625100]; Natural Science Foundation of Liaoning Province of China [2013020093] |
| 语种 | 英语 |
| 公开日期 | 2016-12-28 |
| 源URL | [http://ir.imr.ac.cn/handle/321006/76181]  |
| 专题 | 金属研究所_中国科学院金属研究所 |
| 推荐引用方式 GB/T 7714 | Guo, CQ,Pei, ZL,Fan, D,et al. Predicting multilayer film's residual stress from its monolayers[J]. MATERIALS & DESIGN,2016,110:858-864. |
| APA | Guo, CQ,Pei, ZL,Fan, D,Liu, RD,Gong, J,&Sun, C.(2016).Predicting multilayer film's residual stress from its monolayers.MATERIALS & DESIGN,110,858-864. |
| MLA | Guo, CQ,et al."Predicting multilayer film's residual stress from its monolayers".MATERIALS & DESIGN 110(2016):858-864. |
入库方式： OAI收割
来源：金属研究所
浏览0
下载0
收藏0
其他版本
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。