Deposition of thick Si coating with low residual stress on SiC ceramics by fabricating multilayer with compressive/tensile stress layer-pairs
文献类型：期刊论文
| 作者 | Yang, Yong1; Zhang, Junwei1,2; Fu, Chaoli1,3; Liu, Guiling1; Liu, Yan1; Yao, Xiumin1; Liu, Xuejian1; Chen, Zhongming1; Huang, Zhengren1 |
| 刊名 | MATERIALS & DESIGN
 |
| 出版日期 | 2016-10-05 |
| 卷号 | 107页码:1-6 |
| 关键词 | SiC ceramics Surface modification Silicon laminated coatings Low residual stress |
| 英文摘要 | Surface modification can significantly improve surface properties of lightweight SiC ceramics as optical component for Large Space Optical Telescope. Usually, thick Si-modified coatings can be applied to cover surface defects and decrease polishing cost/time of SiC ceramics. However, it is one great challenge for depositing thick Si-coating with low residual stress on large-scale SiC ceramics by physical vapor deposition (PVD) method because too large residual stress often leads to the stress cracking of thick coatings. Here, silicon multilayer with alternate compressive/tensile stress layer pairs was designed and deposited alternately onto SiC substrates in order to prepare thick Si-coatings with low residual stresses. The silicon multilayer with compressive/tensile stress pairs were obtained by plasma ion assisted deposition and electron beam physical vapor deposition, respectively. The total thickness of as-deposited Si-multilayer can reach as much as 20 pm. Remarkably, the residual stress of silicon-multilayer tends to be negligible. Meanwhile, thick Si-coating bonds tightly with SiC substrate, and shows ultra-flat mirror surface with surface roughness of 0.69 nm RMS after polishing. It is demonstrated that silicon multilayer with low residual stress is a promising way to realize surface modification of SiC ceramics for optical mirror application. (C) 2016 Elsevier Ltd. All rights reserved. |
| WOS标题词 | Science & Technology ; Technology |
| 类目[WOS] | Materials Science, Multidisciplinary |
| 研究领域[WOS] | Materials Science |
| 关键词[WOS] | CHEMICAL-VAPOR-DEPOSITION ; SILICON-CARBIDE CERAMICS ; MECHANICAL-PROPERTIES ; FILMS ; MICROSTRUCTURE ; PROPERTY ; STRENGTH ; MIRRORS |
| 收录类别 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000381532800001 |
| 源URL | [http://ir.sic.ac.cn/handle/331005/22112]  |
| 专题 | 上海硅酸盐研究所_结构陶瓷与复合材料工程研究中心_期刊论文 |
| 作者单位 | 1.Chinese Acad Sci, Shanghai Inst Ceram, State Key Lab High Performance Ceram & Superfine, 1295 Dingxi Rd, Shanghai 200050, Peoples R China 2.Univ Chinese Acad Sci, 19 Yuquan Rd, Beijing 100039, Peoples R China 3.Shanghai Univ, 99 Shangda Rd, Shanghai 200444, Peoples R China |
| 推荐引用方式 GB/T 7714 | Yang, Yong,Zhang, Junwei,Fu, Chaoli,et al. Deposition of thick Si coating with low residual stress on SiC ceramics by fabricating multilayer with compressive/tensile stress layer-pairs[J]. MATERIALS & DESIGN,2016,107:1-6. |
| APA | Yang, Yong.,Zhang, Junwei.,Fu, Chaoli.,Liu, Guiling.,Liu, Yan.,...&Huang, Zhengren.(2016).Deposition of thick Si coating with low residual stress on SiC ceramics by fabricating multilayer with compressive/tensile stress layer-pairs.MATERIALS & DESIGN,107,1-6. |
| MLA | Yang, Yong,et al."Deposition of thick Si coating with low residual stress on SiC ceramics by fabricating multilayer with compressive/tensile stress layer-pairs".MATERIALS & DESIGN 107(2016):1-6. |
入库方式： OAI收割
来源：上海硅酸盐研究所
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