It is of great interest to develop a simple, low-cost and environmentally friendly technology for meeting the ever-increasing demands of nanostructured thin films because of their outstanding and unique properties. Herein, we explored a novel and facile synthetic route by applying the magnetron sputtering technology and the low-temperature plasma nitriding treatment to yield nanostructured TiN-based thin films. The reported approach combined control over porosity and shape of the nanostructure and compatibility with the other methods for decorating the nanostructure in situ. The nanostructured TiN-based thin films showed high specific area (768.2 m²·g^− 1), high transmittance and changeable wettability from hydrophobic to hydrophilic corresponding with the morphology evolution from pillars to nets (or cirri). In addition, a hybrid film including amorphous-nanohoop CH and nanostructured TiN successfully integrated flexible, superhard and lubricant effects. The synthesis presents a promising route for a large-scale production of nanostructured thin films applying in a large variety of fields.