Resputtering of zinc oxide films prepared by radical assisted sputtering
文献类型：期刊论文
| 作者 | Qiuming Song; Bingjun Wu; Bin Xie; Feng Huang; Ming Li; Haiqian Wang; Yousong Jiang; Yizhou Song |
| 刊名 | JOURNAL OF APPLIED PHYSICS
 |
| 出版日期 | 2009 |
| 卷号 | 105期号:4 |
| 英文摘要 | Sputtering losses of zinc oxide films prepared by radical assisted sputtering were studied. It was found that the sputtering loss can be very severe in oxygenous sputtering processes of zinc oxide films. In general, resputtering caused by negative oxygen ions dominates the sputteringloss, while diffuse deposition plays a minor role. Resputtering is strongly correlated with the sputtering threshold energy of the deposited filmsand the concentration of O- in the sputtering zone. The balance between the oxygen concentration in the sputtering zone and the oxidation degreeof the growing films depends on the sputtering rate. Our research suggests that a lower oxygen concentration in the sputtering zone and a higheroxidation degree of the growing films are favorable for reducing the resputtering losses. The sputtering loss mechanisms discussed in this work are also helpful for understanding the deposition processes of other magnetron sputtering systems. |
| 收录类别 | SCI |
| 原文出处 | http://jap.aip.org/resource/1/japiau/v105/i6/p069901_s1 |
| 语种 | 英语 |
| 源URL | [http://ir.siat.ac.cn:8080/handle/172644/2336]  |
| 专题 | 深圳先进技术研究院_集成所 |
| 作者单位 | JOURNAL OF APPLIED PHYSICS |
| 推荐引用方式 GB/T 7714 | Qiuming Song,Bingjun Wu,Bin Xie,et al. Resputtering of zinc oxide films prepared by radical assisted sputtering[J]. JOURNAL OF APPLIED PHYSICS,2009,105(4). |
| APA | Qiuming Song.,Bingjun Wu.,Bin Xie.,Feng Huang.,Ming Li.,...&Yizhou Song.(2009).Resputtering of zinc oxide films prepared by radical assisted sputtering.JOURNAL OF APPLIED PHYSICS,105(4). |
| MLA | Qiuming Song,et al."Resputtering of zinc oxide films prepared by radical assisted sputtering".JOURNAL OF APPLIED PHYSICS 105.4(2009). |
入库方式： OAI收割
来源：深圳先进技术研究院
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