Influence of rubber nanoparticles on the properties of Novolac-diazonaphthoquinone based photoresist
文献类型：会议论文
| 作者 | Qiang Liu; Guoping Zhang; Rong Sun; S. W. Ricky Lee; Chingping Wong |
| 出版日期 | 2015 |
| 会议名称 | The 16th International Conference on electronic packing Technology (ICEPT 2015) |
| 会议地点 | Changsha,China |
| 英文摘要 | In the present study, we have been trying to improve adhesion, heat resistant and chemistry resistant of positive photoresists through introducing rubber nanoparticles into positive photoresist (Novolac-diazonaphthoquinone) system. Thereinto, the photoresist sample with 8 wt% of rubber nanoparticles possess higher thermal stability (322.8 oC@ 5wt% loss), higher adhesion strength (402.50 Kg/cm2). Furthermore, the photoresist film after curing can sustain various chemicals, such as acid, base and organic solvent. At last, the novel positive photoresist was also exposed at 365 nm (I line) and developed in base solution to yield ultrafine pattern. Therefore, we developed novel photoresist including rubber nanoparticles which possess excellent complex performance and can be used as structural material in device. |
| 收录类别 | EI |
| 语种 | 英语 |
| 源URL | [http://ir.siat.ac.cn:8080/handle/172644/6762]  |
| 专题 | 深圳先进技术研究院_集成所 |
| 作者单位 | 2015 |
| 推荐引用方式 GB/T 7714 | Qiang Liu,Guoping Zhang,Rong Sun,et al. Influence of rubber nanoparticles on the properties of Novolac-diazonaphthoquinone based photoresist[C]. 见:The 16th International Conference on electronic packing Technology (ICEPT 2015). Changsha,China. |
入库方式： OAI收割
来源：深圳先进技术研究院
浏览0
下载0
收藏0
其他版本
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。