Novel low-κ ADH-based periodic mesoporous organosilica thin film for interlayer dielectric
文献类型：会议论文
| 作者 | Jiawei Zhang; Guoping Zhang; Rong Sun; S. W. Ricky Lee; C. P. Wong |
| 出版日期 | 2016 |
| 会议名称 | The 17th International Conference on electronic packing Technology (ICEPT 2016) |
| 会议地点 | Changsha,China |
| 英文摘要 | A low-dielectric-constant organosilica was developed for interlayer dielectric, introducing adamantane which possesses low polarity and unique rigid structure. Novel organosilane precursor, adamantane-bridged organosilane precursor, was synthesized and characterized. Precursor was mixed with porogen P123, acid and ethanol to prepare coating solution, and the novel periodic mesoporous organosilica (PMO) thin film was prepared via evaporation-induced self-assembly method. The PMO thin film presents ultra-low dielectric constants (1.56@1 MHz) and high Young’s modulus (6.69±0.54 GPa) via optimizing the porogen content, besides it shows order structure and hydrophobic property. |
| 收录类别 | EI |
| 语种 | 英语 |
| 源URL | [http://ir.siat.ac.cn:8080/handle/172644/10105]  |
| 专题 | 深圳先进技术研究院_集成所 |
| 作者单位 | 2016 |
| 推荐引用方式 GB/T 7714 | Jiawei Zhang,Guoping Zhang,Rong Sun,et al. Novel low-κ ADH-based periodic mesoporous organosilica thin film for interlayer dielectric[C]. 见:The 17th International Conference on electronic packing Technology (ICEPT 2016). Changsha,China. |
入库方式： OAI收割
来源：深圳先进技术研究院
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