Facile Image Patterning via Sequential Thiol–Michael/Thiol–Yne Click Reactions
文献类型：期刊论文
| 作者 | Haiyan Peng; Chen Wang;Weixian Xi; Benjamin A Kowalski; Tao Gong; Xiaolin Xie; Wentao Wang; Devatha P. Nair; Robert R. McLeod; Christopher N. Bowman |
| 刊名 | CHEMISTRY OF MATERIALS
 |
| 出版日期 | 2014 |
| 英文摘要 | Freestanding substrates with high refractive index modulation, good oxygen resistance, and low volume shrinkage are critical in photolithography for the purpose of high density data storage, image patterning and anticounterfeiting. Herein, we demonstrate a novel paradigm of direct holographic image patterning via the radical-mediated thiolyne click reaction subsequent to the base-catalyzed thiol-Michael addition reaction. With the benefit of a newly synthesized alkyne monomer, 9-(2-((2-(prop-2-yn-1-yloxy)ethyl)thio)ethyl)-9H-carbazole (POETEC), holograms with as high as 96% diffraction efficiency, refractive index modulation of 0.0036, dynamic range of 5.6 per 200 mu m and volume shrinkage of 1.1%, are successfully patterned in an aerobic environment. Uniquely and distinctly, an inhibitor is unnecessary to prevent the initiation of the sequential reaction in this framework. |
| 收录类别 | SCI |
| 原文出处 | http://pubs.acs.org/doi/abs/10.1021/cm5034436 |
| 语种 | 英语 |
| 源URL | [http://ir.siat.ac.cn:8080/handle/172644/6235]  |
| 专题 | 深圳先进技术研究院_南沙所 |
| 作者单位 | CHEMISTRY OF MATERIALS |
| 推荐引用方式 GB/T 7714 | Haiyan Peng,Chen Wang；Weixian Xi,Benjamin A Kowalski,et al. Facile Image Patterning via Sequential Thiol–Michael/Thiol–Yne Click Reactions[J]. CHEMISTRY OF MATERIALS,2014. |
| APA | Haiyan Peng.,Chen Wang；Weixian Xi.,Benjamin A Kowalski.,Tao Gong.,Xiaolin Xie.,...&Christopher N. Bowman.(2014).Facile Image Patterning via Sequential Thiol–Michael/Thiol–Yne Click Reactions.CHEMISTRY OF MATERIALS. |
| MLA | Haiyan Peng,et al."Facile Image Patterning via Sequential Thiol–Michael/Thiol–Yne Click Reactions".CHEMISTRY OF MATERIALS (2014). |
入库方式： OAI收割
来源：深圳先进技术研究院
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