中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Closed-Form Expressions for the Resistance and the Inductance of Different Profiles of Through-Silicon Vias

文献类型:期刊论文

作者Yuanjun Liang; Ye Li
刊名IEEE ELECTRON DEVICE LETTERS
出版日期2011
卷号32期号:3页码:393-395
英文摘要In this letter, closed-form expressions are proposed to calculate the parasitic resistance and inductance of different profiles of through-silicon vias (TSVs). The formulas for the tapered TSV are developed as the functions of the geometric parameters of the via. The expressions also cover the straight TSV when the slope wall angle is zero. The comparison between the formulas and numerical electromagnetic results shows that the formulas have high accuracy at low frequency, with maximum errors of 2% and 5% for the resistance and the inductance, respectively. The errors increase at high frequencies due to the skin effect and can be minimized by using fitting parameters.
收录类别SCI
原文出处http://ieeexplore.ieee.org/xpls/abs_all.jsp?arnumber=5706346&tag=1
语种英语
源URL[http://ir.siat.ac.cn:8080/handle/172644/3465]  
专题深圳先进技术研究院_医工所
作者单位IEEE ELECTRON DEVICE LETTERS
推荐引用方式
GB/T 7714
Yuanjun Liang,Ye Li. Closed-Form Expressions for the Resistance and the Inductance of Different Profiles of Through-Silicon Vias[J]. IEEE ELECTRON DEVICE LETTERS,2011,32(3):393-395.
APA Yuanjun Liang,&Ye Li.(2011).Closed-Form Expressions for the Resistance and the Inductance of Different Profiles of Through-Silicon Vias.IEEE ELECTRON DEVICE LETTERS,32(3),393-395.
MLA Yuanjun Liang,et al."Closed-Form Expressions for the Resistance and the Inductance of Different Profiles of Through-Silicon Vias".IEEE ELECTRON DEVICE LETTERS 32.3(2011):393-395.

入库方式: OAI收割

来源:深圳先进技术研究院

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