Well-controlled wet etching of ZnO films using hydrogen peroxide solution
文献类型：期刊论文
| 作者 | Yuchao Wang; Tianzhun Wu; Mingming Chen; Longxing Su; Quanlin Zhang; Lifang Yuan; Yuan Zhu; Zikang Tang |
| 刊名 | APPLIED SURFACE SCIENCE
 |
| 出版日期 | 2014 |
| 英文摘要 | We propose hydrogen peroxide (H2O2) solution as a novel and promising etchant for ZnO thin film with well-controlled etching performances and enhanced ultraviolet (UV) luminescence, which is also facile, inexpensive and environmentally friendly. We have analyzed its etching mechanism and surface modification effect for ZnO. Using this etchant, fine patterns have been transferred to the ZnO single-crystal films with good fidelity. The etching performances have been comprehensively investigated using Raman spectroscopy, scanning electronic microscopy (SEM), atom force microscopy (AFM), surface profiler and photoluminescence (PL) spectrometer. The results have shown that ZnO films after the long-time etching exhibited linear etching rate, smooth profile and increased UV emission, which enables H2O2 solution as an excellent wet etchant for various ZnO-based optoelectronic devices. (C) 2013 Published by Elsevier B.V. |
| 收录类别 | SCI |
| 原文出处 | http://www.sciencedirect.com/science/article/pii/S0169433213021314 |
| 语种 | 英语 |
| 源URL | [http://ir.siat.ac.cn:8080/handle/172644/5811]  |
| 专题 | 深圳先进技术研究院_医工所 |
| 作者单位 | APPLIED SURFACE SCIENCE |
| 推荐引用方式 GB/T 7714 | Yuchao Wang,Tianzhun Wu,Mingming Chen,et al. Well-controlled wet etching of ZnO films using hydrogen peroxide solution[J]. APPLIED SURFACE SCIENCE,2014. |
| APA | Yuchao Wang.,Tianzhun Wu.,Mingming Chen.,Longxing Su.,Quanlin Zhang.,...&Zikang Tang.(2014).Well-controlled wet etching of ZnO films using hydrogen peroxide solution.APPLIED SURFACE SCIENCE. |
| MLA | Yuchao Wang,et al."Well-controlled wet etching of ZnO films using hydrogen peroxide solution".APPLIED SURFACE SCIENCE (2014). |
入库方式： OAI收割
来源：深圳先进技术研究院
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