中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
High-resistive layers obtained through periodic growth and in situ annealing of InGaN by metalorganic chemical vapor deposition

文献类型:期刊论文

作者Shuo Zhang ; Ping Ma ; Boting Liu ; Dongxue Wu ; Yuliang Huang ; Junxi Wang ; Jinmin Li
刊名aip advances
出版日期2016
卷号6期号:6页码:065301
学科主题半导体器件
收录类别SCI
公开日期2017-03-16
源URL[http://ir.semi.ac.cn/handle/172111/28108]  
专题半导体研究所_中科院半导体照明研发中心
推荐引用方式
GB/T 7714
Shuo Zhang,Ping Ma,Boting Liu,et al. High-resistive layers obtained through periodic growth and in situ annealing of InGaN by metalorganic chemical vapor deposition[J]. aip advances,2016,6(6):065301.
APA Shuo Zhang.,Ping Ma.,Boting Liu.,Dongxue Wu.,Yuliang Huang.,...&Jinmin Li.(2016).High-resistive layers obtained through periodic growth and in situ annealing of InGaN by metalorganic chemical vapor deposition.aip advances,6(6),065301.
MLA Shuo Zhang,et al."High-resistive layers obtained through periodic growth and in situ annealing of InGaN by metalorganic chemical vapor deposition".aip advances 6.6(2016):065301.

入库方式: OAI收割

来源:半导体研究所

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