中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Photoconductive probing of the trap distribution in switchable interfaces

文献类型:期刊论文

作者Tian, Y; Zhang, JM; Guo, CF; Zhang, BS(张宝顺); Liu, Q
刊名NANOSCALE
出版日期2016
卷号8期号:2
通讯作者Zhang, BS(张宝顺)
英文摘要Interfacial resistive switching features are highly dependent on the distribution of the carrier traps in the interface. However, the lack of probing seriously restricts ways of offering physical insights into its mechanism and improving interfacial resistors. In this work, we investigated a resistive switching interface that consists of Bi2S3 nano networks (BSNN) and F-doped SnO2 (FTO), uncovering the relationship between the decay of the photoconductance in BSNN and interfacial trap distribution. Based on this, we suggest a general method to probe the distribution of various interface traps. This method provides us with a new tool to study the interfacial trap distribution in an interfacial resistor, and it might also be used to understand other interface problems.
关键词[WOS]PHOTODETECTORS ; NANOWIRES ; FILMS
收录类别SCI ; EI
语种英语
WOS记录号WOS:000367258500027
源URL[http://ir.sinano.ac.cn/handle/332007/4698]  
专题苏州纳米技术与纳米仿生研究所_纳米加工公共平台
推荐引用方式
GB/T 7714
Tian, Y,Zhang, JM,Guo, CF,et al. Photoconductive probing of the trap distribution in switchable interfaces[J]. NANOSCALE,2016,8(2).
APA Tian, Y,Zhang, JM,Guo, CF,Zhang, BS,&Liu, Q.(2016).Photoconductive probing of the trap distribution in switchable interfaces.NANOSCALE,8(2).
MLA Tian, Y,et al."Photoconductive probing of the trap distribution in switchable interfaces".NANOSCALE 8.2(2016).

入库方式: OAI收割

来源:苏州纳米技术与纳米仿生研究所

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