中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Stress evolution in AlN and GaN grown on Si(111): experiments and theoretical modeling

文献类型:期刊论文

作者Dai, YQ; Li, SM; Gao, HW; Wang, WH; Sun, Q(孙钱); Peng, Q; Gui, CQ; Qian, ZF; Liu, S
刊名JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS
出版日期2016
卷号27期号:2
通讯作者Dai, YQ ; Liu, S
英文摘要We introduce a temperature dependent anisotropic model for the stresses in gallium nitride (GaN) and aluminum nitride (AlN) films grown on Si(111) substrates and their epiwafer bow effects caused by thermal mismatch between the film and substrate. The model is verified by Raman scattering experiments with carefully prepared samples. The stresses analyzed from Raman frequency shifts in experiments show excellent agreement with the stresses from finite element modeling simulations. The interaction force mechanisms and the impact factors are compared. The analysis provides an insight in understanding the defect behaviors in film growth. Our model could be useful in the evaluation of the residual stresses and deformations in film growth control, post thermal process in device manufacture, packaging, and reliability estimation.
关键词[WOS]THERMAL-EXPANSION ; LATTICE-PARAMETERS ; ELASTIC-CONSTANTS ; THIN-FILMS ; CRYSTALS ; ALGAN ; SEMICONDUCTORS ; SILICON ; DEVICES ; STATE
收录类别SCI
语种英语
WOS记录号WOS:000369010900128
源URL[http://ir.sinano.ac.cn/handle/332007/4899]  
专题苏州纳米技术与纳米仿生研究所_纳米器件及相关材料研究部_孙钱团队
推荐引用方式
GB/T 7714
Dai, YQ,Li, SM,Gao, HW,et al. Stress evolution in AlN and GaN grown on Si(111): experiments and theoretical modeling[J]. JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS,2016,27(2).
APA Dai, YQ.,Li, SM.,Gao, HW.,Wang, WH.,Sun, Q.,...&Liu, S.(2016).Stress evolution in AlN and GaN grown on Si(111): experiments and theoretical modeling.JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS,27(2).
MLA Dai, YQ,et al."Stress evolution in AlN and GaN grown on Si(111): experiments and theoretical modeling".JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS 27.2(2016).

入库方式: OAI收割

来源:苏州纳米技术与纳米仿生研究所

浏览0
下载0
收藏0
其他版本

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。