Facile Peeling Method as a Post-Remedy Strategy for Producing an Ultrasmooth Self-Assembled Monolayer for High-Performance Organic Transistors
文献类型：期刊论文
| 作者 | Chen, XS; Xu, ZY; Wu, KJ; Zhang, SN; Li, HW; Meng, YC; Wang, ZW; Li, LQ(李立强); Ma, XM |
| 刊名 | LANGMUIR
 |
| 出版日期 | 2016 |
| 卷号 | 32期号:37 |
| 通讯作者 | Ma, XM ; Li, LQ(李立强) |
| 英文摘要 | The modification of dielectric surface with a self-assembled monolayer (SAM) such as octadecyltrichlorosilane (OTS) is a widely used method to tune the electrical property of diverse electronic devices based on organic semiconductors, graphene, transition metal dichalcogenides (TMDs), and so forth. The surface roughness of self-assembled OTS monolayer is a key factor in determining its effect on device performance, but the preparation of an ultrasmooth OTS monolayer is a technologically challenging task. In this work, an ultrasmooth OTS monolayer is prepared via a facile peeling method, which may serve as a postremedy strategy to remove the protuberant aggregates. Such a method has not been reported before. With organic semiconductors as a testing model, ultrasmooth OTS may significantly improve the charge mobility of organic field-effect transistors (OFETs). P-type dinaphtho [2,3-b :2',3'-f]thieno[3,2-b]thiophene (DNTT) OFET with an ultrasmooth OTS monolayer yields good reproducibility and unprecendented maximum mobility of 8.16 cm(2) V-1 s(-1), which is remarkably superior to that of the OFET with a pristine OTS monolayer. This work develops a simple method to resolve the common and significant problem of the quality of OTS modification, which would be highly promising for electronic applications as well as other fields such as surface and interface engineering. |
| 关键词[WOS] | FIELD-EFFECT TRANSISTORS ; THIN-FILM TRANSISTORS ; MOLECULAR-ORIENTATION ; MONO LAYERS ; OCTADECYLTRICHLOROSILANE ; GRAPHENE ; SURFACE ; STABILITY ; GROWTH ; SEMICONDUCTOR |
| 收录类别 | SCI ; EI |
| 语种 | 英语 |
| WOS记录号 | WOS:000384038200014 |
| 源URL | [http://ir.sinano.ac.cn/handle/332007/4909]  |
| 专题 | 苏州纳米技术与纳米仿生研究所_先进材料研究部_李立强团队 |
| 推荐引用方式 GB/T 7714 | Chen, XS,Xu, ZY,Wu, KJ,et al. Facile Peeling Method as a Post-Remedy Strategy for Producing an Ultrasmooth Self-Assembled Monolayer for High-Performance Organic Transistors[J]. LANGMUIR,2016,32(37). |
| APA | Chen, XS.,Xu, ZY.,Wu, KJ.,Zhang, SN.,Li, HW.,...&Ma, XM.(2016).Facile Peeling Method as a Post-Remedy Strategy for Producing an Ultrasmooth Self-Assembled Monolayer for High-Performance Organic Transistors.LANGMUIR,32(37). |
| MLA | Chen, XS,et al."Facile Peeling Method as a Post-Remedy Strategy for Producing an Ultrasmooth Self-Assembled Monolayer for High-Performance Organic Transistors".LANGMUIR 32.37(2016). |
入库方式： OAI收割
浏览0
下载0
收藏0
其他版本
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。