Vanadium dioxide film protected with an atomic-layer-deposited Al2O3 thin film
文献类型:期刊论文
作者 | Wang, Xiao; Cao, Yunzhen; Yang, Chao; Yan, Lu; Li, Ying |
刊名 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
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出版日期 | 2016 |
卷号 | 34期号:1 |
英文摘要 | A VO2 film exposed to ambient air is prone to oxidation, which will degrade its thermochromic properties. In this work, the authors deposited an ultrathin Al2O3 film with atomic layer deposition (ALD) to protect the underlying VO2 film from degradation, and then studied the morphology and crystalline structure of the films. To assess the protectiveness of the Al2O3 capping layer, the authors performed a heating test and a damp heating test. An ultrathin 5-nm-thick ALD Al2O3 film was sufficient to protect the underlying VO2 film heated at 350 degrees C. However, in a humid environment at prolonged durations, a thicker ALD Al2O3 film (15 nm) was required to protect the VO2. The authors also deposited and studied a TiO2/Al2O3 bilayer, which significantly improved the protectiveness of the Al2O3 film in a humid environment. (C) 2015 American Vacuum Society. |
WOS标题词 | Science & Technology ; Technology ; Physical Sciences |
类目[WOS] | Materials Science, Coatings & Films ; Physics, Applied |
研究领域[WOS] | Materials Science ; Physics |
关键词[WOS] | BINARY REACTION SEQUENCE ; SWITCHING PROPERTIES ; COATINGS ; TEMPERATURE ; TRANSPARENT ; RESISTANCE ; CHEMISTRY ; BILAYERS ; GROWTH ; H2O |
收录类别 | SCI |
语种 | 英语 |
WOS记录号 | WOS:000375115800007 |
源URL | [http://ir.sic.ac.cn/handle/331005/23112] ![]() |
专题 | 上海硅酸盐研究所_特种无机涂层重点实验室_期刊论文 |
作者单位 | Chinese Acad Sci, Shanghai Inst Ceram, Key Lab Inorgan Coating Mat, 588 Heshuo Rd, Shanghai 201800, Peoples R China |
推荐引用方式 GB/T 7714 | Wang, Xiao,Cao, Yunzhen,Yang, Chao,et al. Vanadium dioxide film protected with an atomic-layer-deposited Al2O3 thin film[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A,2016,34(1). |
APA | Wang, Xiao,Cao, Yunzhen,Yang, Chao,Yan, Lu,&Li, Ying.(2016).Vanadium dioxide film protected with an atomic-layer-deposited Al2O3 thin film.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A,34(1). |
MLA | Wang, Xiao,et al."Vanadium dioxide film protected with an atomic-layer-deposited Al2O3 thin film".JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 34.1(2016). |
入库方式: OAI收割
来源:上海硅酸盐研究所
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