中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Vanadium dioxide film protected with an atomic-layer-deposited Al2O3 thin film

文献类型:期刊论文

作者Wang, Xiao; Cao, Yunzhen; Yang, Chao; Yan, Lu; Li, Ying
刊名JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
出版日期2016
卷号34期号:1
英文摘要

A VO2 film exposed to ambient air is prone to oxidation, which will degrade its thermochromic properties. In this work, the authors deposited an ultrathin Al2O3 film with atomic layer deposition (ALD) to protect the underlying VO2 film from degradation, and then studied the morphology and crystalline structure of the films. To assess the protectiveness of the Al2O3 capping layer, the authors performed a heating test and a damp heating test. An ultrathin 5-nm-thick ALD Al2O3 film was sufficient to protect the underlying VO2 film heated at 350 degrees C. However, in a humid environment at prolonged durations, a thicker ALD Al2O3 film (15 nm) was required to protect the VO2. The authors also deposited and studied a TiO2/Al2O3 bilayer, which significantly improved the protectiveness of the Al2O3 film in a humid environment. (C) 2015 American Vacuum Society.

WOS标题词Science & Technology ; Technology ; Physical Sciences
类目[WOS]Materials Science, Coatings & Films ; Physics, Applied
研究领域[WOS]Materials Science ; Physics
关键词[WOS]BINARY REACTION SEQUENCE ; SWITCHING PROPERTIES ; COATINGS ; TEMPERATURE ; TRANSPARENT ; RESISTANCE ; CHEMISTRY ; BILAYERS ; GROWTH ; H2O
收录类别SCI
语种英语
WOS记录号WOS:000375115800007
源URL[http://ir.sic.ac.cn/handle/331005/23112]  
专题上海硅酸盐研究所_特种无机涂层重点实验室_期刊论文
作者单位Chinese Acad Sci, Shanghai Inst Ceram, Key Lab Inorgan Coating Mat, 588 Heshuo Rd, Shanghai 201800, Peoples R China
推荐引用方式
GB/T 7714
Wang, Xiao,Cao, Yunzhen,Yang, Chao,et al. Vanadium dioxide film protected with an atomic-layer-deposited Al2O3 thin film[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A,2016,34(1).
APA Wang, Xiao,Cao, Yunzhen,Yang, Chao,Yan, Lu,&Li, Ying.(2016).Vanadium dioxide film protected with an atomic-layer-deposited Al2O3 thin film.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A,34(1).
MLA Wang, Xiao,et al."Vanadium dioxide film protected with an atomic-layer-deposited Al2O3 thin film".JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 34.1(2016).

入库方式: OAI收割

来源:上海硅酸盐研究所

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