中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Realization of nitride-oxide based p-n heterojunctions with the n-VO2/p-GaN/sapphire structure

文献类型:期刊论文

作者Li, Xiaoxuan1; Bian, Jiming1,2; Wang, Minhuan1; Miao, Lihua1; Liu, Hongzhu1; Qin, Fuwen1; Zhang, Yuzhi2; Luo, Yingmin1
刊名MATERIALS RESEARCH BULLETIN
出版日期2016-05-01
卷号77页码:199-204
关键词Nitrides Oxide Thin films Sputtering Electrical properties
英文摘要The nitride-oxide based p-n heterojunctions with the n-VO2/p-GaN/sapphire structure was realized by sputtering deposition of VO2 films on p-GaN/sapphire substrates. The structure and electrical properties of the as-grown VO2/p-GaN/sapphire heterostructure were investigated systematically. The distinct reversible semiconductor-to-metal transition (SMT) with resistance change up to nearly two orders of magnitude was observed for the sample deposited at the optimized conditions. Moreover, the clear rectifying current-voltage characteristics originated from the n-VO2/p-GaN interface were demonstrated both before and after SMT of VO2 over layer, which were attributed to the p-n junction behavior and Schottky contact character, respectively. Our present finding demonstrated the feasibility of integrating correlated oxide and wide bandgap nitride semiconductors, and will further motivate research in novel devices with combined functional properties of both kinds of materials. (C) 2016 Elsevier Ltd. All rights reserved.
WOS标题词Science & Technology ; Technology
类目[WOS]Materials Science, Multidisciplinary
研究领域[WOS]Materials Science
关键词[WOS]METAL-INSULATOR-TRANSITION ; VO2 THIN-FILMS ; DENSITY ; MEMORY
收录类别SCI
语种英语
WOS记录号WOS:000374360700029
源URL[http://ir.sic.ac.cn/handle/331005/23123]  
专题上海硅酸盐研究所_特种无机涂层重点实验室_期刊论文
作者单位1.Dalian Univ Technol, Key Lab Mat Modificat Laser Ion & Electron Beams, Minist Educ, Sch Phys & Optoelect Technol, Dalian 116024, Peoples R China
2.Chinese Acad Sci, Key Lab Inorgan Coating Mat, Shanghai 200050, Peoples R China
推荐引用方式
GB/T 7714
Li, Xiaoxuan,Bian, Jiming,Wang, Minhuan,et al. Realization of nitride-oxide based p-n heterojunctions with the n-VO2/p-GaN/sapphire structure[J]. MATERIALS RESEARCH BULLETIN,2016,77:199-204.
APA Li, Xiaoxuan.,Bian, Jiming.,Wang, Minhuan.,Miao, Lihua.,Liu, Hongzhu.,...&Luo, Yingmin.(2016).Realization of nitride-oxide based p-n heterojunctions with the n-VO2/p-GaN/sapphire structure.MATERIALS RESEARCH BULLETIN,77,199-204.
MLA Li, Xiaoxuan,et al."Realization of nitride-oxide based p-n heterojunctions with the n-VO2/p-GaN/sapphire structure".MATERIALS RESEARCH BULLETIN 77(2016):199-204.

入库方式: OAI收割

来源:上海硅酸盐研究所

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