Sputtering Deposition of VO2 Film Using Plasma Emission Monitor as Reactive Gas Flow Rate Feedback Control
文献类型：期刊论文
| 作者 | Wang Xiao; Yan Lu; Li Ying; Cao Yun-Zhen |
| 刊名 | JOURNAL OF INORGANIC MATERIALS
 |
| 出版日期 | 2015-11-01 |
| 卷号 | 30期号:11页码:1228-1232 |
| 关键词 | vanadium dioxide plasma emission monitor feedback control reactive sputtering thin films |
| 英文摘要 | Monoclinic VO2 film was deposited on quartz substrate by reactive sputtering using the plasma emission monitor (PEM) system as reactive gas flow rate feedback control. Relationship between oxygen flow rate and plasma emission intensity was studied. It was found that single-phase VO2(M) could be obtained steadily at specific relative emission intensity (RED, which were determined as 0.6-0.65, 0.65 and 0.6 for total deposition pressure of 0.8 Pa, 0.5 Pa and 0.2 Pa, respectively. XRD measurement indicated that the deposited VO2 films were strongly oriented of (011) and the XPS measurements verified stoichiometry of the films as VO2.02. Optical transmission measurement of VO2 film exhibited an abrupt change of transmittance from 81% to 16% as VO2 film switched from semiconductor state to metallic state, at transition temperature of 66 degrees C. |
| WOS标题词 | Science & Technology ; Technology |
| 类目[WOS] | Materials Science, Ceramics |
| 研究领域[WOS] | Materials Science |
| 关键词[WOS] | THIN-FILMS ; VANADIUM DIOXIDE ; SWITCHING PROPERTIES ; OPTICAL-PROPERTIES ; TEMPERATURE ; TRANSITION ; MICROSTRUCTURE ; PRESSURE |
| 收录类别 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000365633000018 |
| 源URL | [http://ir.sic.ac.cn/handle/331005/23349]  |
| 专题 | 上海硅酸盐研究所_特种无机涂层重点实验室_期刊论文 |
| 作者单位 | Chinese Acad Sci, Shanghai Inst Ceram, Key Lab Inorgan Coating Mat, Shanghai 200050, Peoples R China |
| 推荐引用方式 GB/T 7714 | Wang Xiao,Yan Lu,Li Ying,et al. Sputtering Deposition of VO2 Film Using Plasma Emission Monitor as Reactive Gas Flow Rate Feedback Control[J]. JOURNAL OF INORGANIC MATERIALS,2015,30(11):1228-1232. |
| APA | Wang Xiao,Yan Lu,Li Ying,&Cao Yun-Zhen.(2015).Sputtering Deposition of VO2 Film Using Plasma Emission Monitor as Reactive Gas Flow Rate Feedback Control.JOURNAL OF INORGANIC MATERIALS,30(11),1228-1232. |
| MLA | Wang Xiao,et al."Sputtering Deposition of VO2 Film Using Plasma Emission Monitor as Reactive Gas Flow Rate Feedback Control".JOURNAL OF INORGANIC MATERIALS 30.11(2015):1228-1232. |
入库方式： OAI收割
来源：上海硅酸盐研究所
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