High throughput fabrication of large-area plasmonic color filters by soft-X-ray interference lithography
文献类型：期刊论文
| 作者 | Sun, LB; Hu, XL; Wu, QJ; Wang, LS; Zhao, J; Yang, SM; Tai, RZ; Fecht, HJ; Zhang, DX; Wang, LQ |
| 刊名 | OPTICS EXPRESS
 |
| 出版日期 | 2016 |
| 卷号 | 24期号:17页码:19112-19121 |
| ISSN号 | 1094-4087 |
| 通讯作者 | Zhang, DX ; Wang, LQ (reprint author), Zhejiang Univ, State Key Lab Modern Opt Instrumentat, Hangzhou 310027, Zhejiang, Peoples R China. ; Jiang, JZ (reprint author), Zhejiang Univ, Int Ctr New Struct Mat, State Key Lab Silicon Mat, Hangzhou 310027, Zhejiang, Peoples R China. ; Jiang, JZ (reprint author), Zhejiang Univ, Sch Mat Sci & Engn, Hangzhou 310027, Zhejiang, Peoples R China. |
| 英文摘要 | Plasmonic color filters in mass production have been restricted from current fabrication technology, which impede their applications. Soft-X-ray interference lithography (XIL) has recently generated considerable interest as a newly developed technique for the production of periodic nano-structures with resolution theoretically below 4 nm. Here we ameliorate XIL by adding an order sorting aperture and designing the light path properly to achieve perfect-stitching nano-patterns and fast fabrication of large-area color filters. The fill factor of nanostructures prepared on ultrathin Ag films can largely affect the transmission minimum of plasmonic color filters. By changing the fill factor, the color can be controlled flexibly, improving the utilization efficiency of the mask in XIL simultaneously. The calculated data agree well with the experimental results. Finally, an underlying mechanism has been uncovered after systematically analyzing the localized surface plasmon polaritons (LSPPs) coupling in electric field distribution. (C) 2016 Optical Society of America |
| 收录类别 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000385227100025 |
| 源URL | [http://ir.sinap.ac.cn/handle/331007/26529]  |
| 专题 | 上海应用物理研究所_中科院上海应用物理研究所2011-2017年 |
| 推荐引用方式 GB/T 7714 | Sun, LB,Hu, XL,Wu, QJ,et al. High throughput fabrication of large-area plasmonic color filters by soft-X-ray interference lithography[J]. OPTICS EXPRESS,2016,24(17):19112-19121. |
| APA | Sun, LB.,Hu, XL.,Wu, QJ.,Wang, LS.,Zhao, J.,...&Jiang, JZ.(2016).High throughput fabrication of large-area plasmonic color filters by soft-X-ray interference lithography.OPTICS EXPRESS,24(17),19112-19121. |
| MLA | Sun, LB,et al."High throughput fabrication of large-area plasmonic color filters by soft-X-ray interference lithography".OPTICS EXPRESS 24.17(2016):19112-19121. |
入库方式： OAI收割
来源：上海应用物理研究所
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