中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Patterning of nanodot-arrays using EUV achromatic Talbot lithography at the Swiss Light Source and Shanghai Synchrotron Radiation Facility

文献类型:期刊论文

作者Fan, D; Buitrago, E; Yang, SM; Karim, W; Wu, YQ; Tai, RZ; Ekinci, Y
刊名MICROELECTRONIC ENGINEERING
出版日期2016
卷号155页码:55-60
关键词EUV Interference lithography High resolution Nano-lithography Achromatic Talbot lithography
ISSN号0167-9317
通讯作者Fan, D ; Buitrago, E (reprint author), Paul Scherrer Inst, Lab Micro & Nanotechnol, CH-5232 Villigen, Switzerland. ; Yang, SM (reprint author), Shanghai Inst Appl Phys, Shanghai Synchrotron Radiat Facil, 239 Zhangheng Rd, Shanghai, Peoples R China.
英文摘要Achromatic Talbot lithography (ATL) at extreme ultraviolet (EUV) wavelengths has been used to produce one or two-dimensional periodic patterns over large areas. In this work, an ATL transmission mask was used to perform EUV exposures at 13.5 nm and 8.8 nm illumination wavelengths at two different synchrotron facilities, to study the broadband nature of the method and the used mask as well as to investigate the influence of illumination parameters and experimental arrangements. The experiments were performed at the Swiss Light Source (SLS), PSI, Switzerland, and at the Shanghai Synchrotron Radiation Facility (SSRF), P. R. China. Achromatic Talbot lithography was proven to be a simple and robust interference lithography scheme for producing large area and high resolution patterns suitable for different wavelengths and for a variety of EUV sources and setups. (C) 2016 Elsevier B.V. All rights reserved.
收录类别SCI
语种英语
WOS记录号WOS:000378962700013
源URL[http://ir.sinap.ac.cn/handle/331007/26592]  
专题上海应用物理研究所_中科院上海应用物理研究所2011-2017年
推荐引用方式
GB/T 7714
Fan, D,Buitrago, E,Yang, SM,et al. Patterning of nanodot-arrays using EUV achromatic Talbot lithography at the Swiss Light Source and Shanghai Synchrotron Radiation Facility[J]. MICROELECTRONIC ENGINEERING,2016,155:55-60.
APA Fan, D.,Buitrago, E.,Yang, SM.,Karim, W.,Wu, YQ.,...&Ekinci, Y.(2016).Patterning of nanodot-arrays using EUV achromatic Talbot lithography at the Swiss Light Source and Shanghai Synchrotron Radiation Facility.MICROELECTRONIC ENGINEERING,155,55-60.
MLA Fan, D,et al."Patterning of nanodot-arrays using EUV achromatic Talbot lithography at the Swiss Light Source and Shanghai Synchrotron Radiation Facility".MICROELECTRONIC ENGINEERING 155(2016):55-60.

入库方式: OAI收割

来源:上海应用物理研究所

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