中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Opacity studies of silicon in radiatively heated plasma

文献类型:期刊论文

作者Wei, H. G.1,3; Shi, J. R.1; Zhao, G.1; Zhang, Yi2; Dong, Quan-Li2; Li, Yu-Tong2; Wang, Shou-Jun2; Zhang, Jie2,6; Liang, Zuotang3; Zhang, Ji-Yan4
刊名ASTROPHYSICAL JOURNAL
出版日期2008-08-10
卷号683期号:1页码:577-583
关键词atomic data methods : laboratory plasmas X-rays : general
英文摘要Measurements of the opacity of silicon at high temperature and high density are reported. A silicon dioxide foam was heated by eight nanosecond laser beams while a backlighter X-ray source was produced with a picosecond laser. Absorptions of the 1-2 transitions of Si XII through Si VI were observed in the wavelength range from 6.6 to 7.1 angstrom. The experimental results are simulated with theoretical calculations under local thermodynamic equilibrium using a detailed level accounting model and can be reproduced in general when the effects of the oxygen in the SiO2 are taken into account.
收录类别SCI
语种英语
WOS记录号WOS:000258296100049
源URL[http://ir.bao.ac.cn/handle/114a11/7382]  
专题国家天文台_光学天文研究部
作者单位1.Chinese Acad Sci, Natl Astron Observ, Beijing 100012, Peoples R China
2.Chinese Acad Sci, Inst Phys, Beijing Natl Lab Condensed Matter Phys, Lab Opt Phys, Beijing 100080, Peoples R China
3.Shandong Univ, Dept Phys, Jinan 250100, Peoples R China
4.China Acad Engn Phys, Res Ctr Laser Fus, Mianyang 621900, Peoples R China
5.Osaka Univ, Inst Laser Engn, Suita, Osaka 5650871, Japan
6.Jiao Tong Univ, Dept Phys, Shanghai 200030, Peoples R China
推荐引用方式
GB/T 7714
Wei, H. G.,Shi, J. R.,Zhao, G.,et al. Opacity studies of silicon in radiatively heated plasma[J]. ASTROPHYSICAL JOURNAL,2008,683(1):577-583.
APA Wei, H. G..,Shi, J. R..,Zhao, G..,Zhang, Yi.,Dong, Quan-Li.,...&Takabe, Hideaki.(2008).Opacity studies of silicon in radiatively heated plasma.ASTROPHYSICAL JOURNAL,683(1),577-583.
MLA Wei, H. G.,et al."Opacity studies of silicon in radiatively heated plasma".ASTROPHYSICAL JOURNAL 683.1(2008):577-583.

入库方式: OAI收割

来源:国家天文台

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