Effects of sapphire substrate annealing on ZnO epitaxial films grown by MOCVD
文献类型:期刊论文
作者 | Wang Yinzhen ; Wang Shunquan ; Zhou SM(周圣明) ; Xu J(徐军) ; Ye Jiandong ; Gu Shulin ; Zhang Rong ; Ren Qiushi |
刊名 | appl. surf. sci.
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出版日期 | 2006 |
卷号 | 253期号:4页码:1745 |
关键词 | ZnO sapphire annealing AFM XRD PL |
ISSN号 | 0169-4332 |
中文摘要 | the annealing effects of sapphire substrate on the quality of epitaxial zno films grown by metalorganic chemical vapor deposition (mocvd) were studied. the atomic steps formed on (0 0 0 1) sapphire (alpha-al2o3) substrate surface by annealing at high temperature was analyzed by atomic force microscopy (afm). the annealing effects of sapphire substrate on the zno films were examined by x-ray diffraction (xrd), afm and photoluminescence (pl) measurements. experimental results indicate that the film quality is strongly affected by annealing treatment of the sapphire substrate surface., the optimum annealing temperature of sapphire substrates is given. (c) 2006 elsevier b.v. all rights reserved. |
学科主题 | 光学材料;晶体 |
收录类别 | EI |
语种 | 英语 |
WOS记录号 | WOS:000243244200010 |
公开日期 | 2009-09-24 |
源URL | [http://ir.siom.ac.cn/handle/181231/5407] ![]() |
专题 | 上海光学精密机械研究所_激光与光电子功能材料研发中心 |
推荐引用方式 GB/T 7714 | Wang Yinzhen,Wang Shunquan,Zhou SM,et al. Effects of sapphire substrate annealing on ZnO epitaxial films grown by MOCVD[J]. appl. surf. sci.,2006,253(4):1745, 1747. |
APA | Wang Yinzhen.,Wang Shunquan.,周圣明.,徐军.,Ye Jiandong.,...&Ren Qiushi.(2006).Effects of sapphire substrate annealing on ZnO epitaxial films grown by MOCVD.appl. surf. sci.,253(4),1745. |
MLA | Wang Yinzhen,et al."Effects of sapphire substrate annealing on ZnO epitaxial films grown by MOCVD".appl. surf. sci. 253.4(2006):1745. |
入库方式: OAI收割
来源:上海光学精密机械研究所
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