Annealing effects of sapphire substrate on properties of ZnO films grown by magnetron sputtering
文献类型：期刊论文
| 作者 | Wang Y. Z. ; Xu J(徐军) |
| 刊名 | appl. phys. a-mater. sci. process.
 |
| 出版日期 | 2007 |
| 卷号 | 88期号:4页码:727 |
| 关键词 | ROOM-TEMPERATURE THIN-FILMS SURFACE FABRICATION EPITAXY |
| ISSN号 | 0947-8396 |
| 中文摘要 | the annealing effects of sapphire substrates on the quality of epitaxial zno films grown by dc reactive magnetron sputtering were studied. the atomic steps formed on (0001) sapphire (alpha-al2o3) substrates surface by annealing at high temperature were analyzed by atomic force microscopy. their influence on the growth of zno films was examined by x-ray diffraction and photoluminescence measurements. experimental results indicate that the film quality is strongly affected by annealing treatment of the sapphire substrate surface. the optimum annealing temperature of sapphire substrates for zno grown by magnetron sputtering is 1400 degrees c for 1 h in air. |
| 学科主题 | 光学材料;晶体 |
| 收录类别 | EI |
| 语种 | 英语 |
| WOS记录号 | WOS:000248064100025 |
| 公开日期 | 2009-09-24 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/5931]  |
| 专题 | 上海光学精密机械研究所_激光与光电子功能材料研发中心 |
| 推荐引用方式 GB/T 7714 | Wang Y. Z.,Xu J. Annealing effects of sapphire substrate on properties of ZnO films grown by magnetron sputtering[J]. appl. phys. a-mater. sci. process.,2007,88(4):727, 729. |
| APA | Wang Y. Z.,&徐军.(2007).Annealing effects of sapphire substrate on properties of ZnO films grown by magnetron sputtering.appl. phys. a-mater. sci. process.,88(4),727. |
| MLA | Wang Y. Z.,et al."Annealing effects of sapphire substrate on properties of ZnO films grown by magnetron sputtering".appl. phys. a-mater. sci. process. 88.4(2007):727. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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