中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
A fixed arc length direct current plasma torch for reduced pressure deposition of thin films

文献类型:会议论文

作者Huang HJ(黄河激); Pan WX(潘文霞); Fu ZQ(付志强); Wu CK(吴承康)
出版日期2011-01-12
会议名称10th Asia-Pacific Conference on Plasma Science and Technology
会议日期2010-07-04~2010-07-08
会议地点Jeju, Korea
通讯作者邮箱huang@imech.ac.cn
关键词fixed-length dc plasma reduced pressure deposition thermal plasma
通讯作者黄河激
中文摘要Because of its high energy density direct current(dc)thermal plasmas are widely accepted as a processing medium which facilitates high processing rates high fluxes of radical species the potential for smaller jnstallations a wide choice of reactants and high quench rates[1].A broad range of industrial processing methods have been developed based on dc plasma technology. However,nonstationary features limited new applications of dc plasma in advanced processing, where reliability£¬reproducibility and precise controllability are required£. These challenges call for better understanding of the arc and jet behavior over a wide range of generating parameters and a comprehensive control of every aspect of lhe plasma processing.
收录类别其他
合作状况国际
会议录10th Asia-Pacific Conference on Plasma Science and Technology.Jeju, Korea.2010-07-04~2010-07-08.
学科主题电磁流体力学和等离子体动力学;;
语种英语
源URL[http://dspace.imech.ac.cn/handle/311007/43291]  
专题力学研究所_等离子体与燃烧中心(2009-2011)
推荐引用方式
GB/T 7714
Huang HJ,Pan WX,Fu ZQ,et al. A fixed arc length direct current plasma torch for reduced pressure deposition of thin films[C]. 见:10th Asia-Pacific Conference on Plasma Science and Technology. Jeju, Korea. 2010-07-04~2010-07-08.

入库方式: OAI收割

来源:力学研究所

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