中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
化学抛光和退火对钛酸锶基片表面改性研究

文献类型:期刊论文

作者陈光珠 ; 杭寅 ; 汪隽等
刊名人工晶体学报
出版日期2008
卷号37期号:5页码:1107
关键词Atomic forces Crystal qualities Mechanical methods Rocking curves SrTiO3 Super-smooth surface
ISSN号1000-985X
其他题名Study on the influence of CMP and anneal to SrTiO3 surface
中文摘要Atomic force microscopy (AFM) was applied to study the surface morphology of SrTiO3 substrates which were polished by traditional mechanical and chemical mechanical method respectively. The influence of anneal was also studied. Results show that the RMS of CMP STO substrates can be 0.214 nm. Compared the rocking curve of the unannealed STO substrates with the annealed ones, it indicates that anneal can improve the crystal quality.
学科主题光学材料;晶体
收录类别EI
语种中文
公开日期2009-09-24
源URL[http://ir.siom.ac.cn/handle/181231/6057]  
专题上海光学精密机械研究所_激光与光电子功能材料研发中心
推荐引用方式
GB/T 7714
陈光珠,杭寅,汪隽等. 化学抛光和退火对钛酸锶基片表面改性研究[J]. 人工晶体学报,2008,37(5):1107, 1112.
APA 陈光珠,杭寅,&汪隽等.(2008).化学抛光和退火对钛酸锶基片表面改性研究.人工晶体学报,37(5),1107.
MLA 陈光珠,et al."化学抛光和退火对钛酸锶基片表面改性研究".人工晶体学报 37.5(2008):1107.

入库方式: OAI收割

来源:上海光学精密机械研究所

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