中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Polishing of (1 0 0) γ-LiAlO2 wafer and its effect on the epitaxial growth of ZnO films by MOCVD

文献类型:期刊论文

作者Hui Lin ; Shengming Zhou ; Hao Teng ; Tingting Jia ; Xiaorui Hou ; Shulin Gu ; Shunming Zhu ; Zili Xie ; Ping Han ; Rong Zhang
刊名Journal of Alloys and Compounds
出版日期2009
期号479
合作状况其它
学科主题其他
收录类别其他
语种中文
公开日期2010-04-22 ; 2010-10-12
源URL[http://ir.siom.ac.cn/handle/181231/6499]  
专题上海光学精密机械研究所_激光与光电子功能材料研发中心
推荐引用方式
GB/T 7714
Hui Lin,Shengming Zhou,Hao Teng,et al. Polishing of (1 0 0) γ-LiAlO2 wafer and its effect on the epitaxial growth of ZnO films by MOCVD[J]. Journal of Alloys and Compounds,2009(479).
APA Hui Lin.,Shengming Zhou.,Hao Teng.,Tingting Jia.,Xiaorui Hou.,...&Rong Zhang.(2009).Polishing of (1 0 0) γ-LiAlO2 wafer and its effect on the epitaxial growth of ZnO films by MOCVD.Journal of Alloys and Compounds(479).
MLA Hui Lin,et al."Polishing of (1 0 0) γ-LiAlO2 wafer and its effect on the epitaxial growth of ZnO films by MOCVD".Journal of Alloys and Compounds .479(2009).

入库方式: OAI收割

来源:上海光学精密机械研究所

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