中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Laser-induced damage threshold of ZrO2 thin films prepared at different oxygen partial pressures by electron-beam evaporation

文献类型:期刊论文

作者Zhang DP ; Shao JA ; Zhao YN ; Fan SH ; Hong RJ(洪瑞金) ; Fan ZX(范正修)
刊名j. vac. sci. technol. a
出版日期2005
卷号23期号:1页码:197
关键词ION-ASSISTED DEPOSITION COATINGS MICROSTRUCTURE DEPENDENCE
ISSN号0734-2101
中文摘要zro2, films were deposited by electron-beam evaporation with the oxygen partial pressure varying from 3 x 10(-3) pa to i i x 10(-3) pa. the phase structure of the samples was characterized by x-ray diffraction (xrd). the thermal absorption of the films was measured by the surface thermal lensing technique. a spectrophotometer was employed to measure the refractive indices of the samples. the laser-induced damage threshold (lidt) was assessed using a 1064, nm nd: yttritium-aluminium-garnet pulsed laser at pulse width of 12 ns. the influence of oxygen partial pressure on the microstructure and lidt of zro2 films was investigated. xrd data revealed that the films changed from polycrystalline to amorphous as the oxygen partial pressure increased. the variation of refractive index at 550 nm wavelength indicated that the packing density of the films decreased gradually with increasing oxygen partial pressure. the absorptance of the samples decreased monotonically from 125.2 to 84.5 ppm with increasing oxygen partial pressure. the damage threshold, values increased from 18.5 to 26.7 j/cm(2) for oxygen partial pressures varying from 3 x 10(-3) pa to 9 x 10(-3) pa, but decreased to 17.3 j/cm(2) in the case of i i x 10(-3) pa. (c) 2005 american vacuum society.
学科主题光学薄膜
收录类别EI
语种英语
公开日期2009-09-22 ; 2010-10-12
源URL[http://ir.siom.ac.cn/handle/181231/4152]  
专题上海光学精密机械研究所_光学薄膜技术研究与发展中心
推荐引用方式
GB/T 7714
Zhang DP,Shao JA,Zhao YN,et al. Laser-induced damage threshold of ZrO2 thin films prepared at different oxygen partial pressures by electron-beam evaporation[J]. j. vac. sci. technol. a,2005,23(1):197, 200.
APA Zhang DP,Shao JA,Zhao YN,Fan SH,洪瑞金,&范正修.(2005).Laser-induced damage threshold of ZrO2 thin films prepared at different oxygen partial pressures by electron-beam evaporation.j. vac. sci. technol. a,23(1),197.
MLA Zhang DP,et al."Laser-induced damage threshold of ZrO2 thin films prepared at different oxygen partial pressures by electron-beam evaporation".j. vac. sci. technol. a 23.1(2005):197.

入库方式: OAI收割

来源:上海光学精密机械研究所

浏览0
下载0
收藏0
其他版本

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。