Design and properties analysis of multi-layer dielectric used in pulse compressor gratings
文献类型：期刊论文
| 作者 | Kong WJ ; Shen ZC ; Shen J ; Shao JD(邵建达) ; Fan ZX(范正修) |
| 刊名 | optik
 |
| 出版日期 | 2005 |
| 卷号 | 116期号:7页码:325 |
| 关键词 | pulse compressor gratings multi-layer dielectric optic properties analysis optic film stack design |
| ISSN号 | 0030-4026 |
| 中文摘要 | used in chirped-pulse amplification system and based on multi-layer thin film stack, pulse compressor gratings (pcg) are etched by ion-beam and holographic techniques. diffraction efficiency and laser-induced damage threshold rely on the structural parameters of gratings. on the other hand, they depend greatly on the design of multi-layer. a theoretic design is given for dielectric multi-layer, which is exposed at 413.1 nm and used at 1053 nm. the influences of coating design on optical characters are described in detail. the analysis shows that a coating stack of h3l (h2l) (boolean and) 9h0.5l2.01h meets the specifications of pcg well. and there is good agreement of transmission between experimental and the theoretic design. (c) 2005 elsevier gmbh. all rights reserved. |
| 学科主题 | 光学薄膜 |
| 收录类别 | EI |
| 语种 | 英语 |
| WOS记录号 | WOS:000231017300003 |
| 公开日期 | 2009-09-22 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/4178]  |
| 专题 | 上海光学精密机械研究所_光学薄膜技术研究与发展中心 |
| 推荐引用方式 GB/T 7714 | Kong WJ,Shen ZC,Shen J,et al. Design and properties analysis of multi-layer dielectric used in pulse compressor gratings[J]. optik,2005,116(7):325, 330. |
| APA | Kong WJ,Shen ZC,Shen J,邵建达,&范正修.(2005).Design and properties analysis of multi-layer dielectric used in pulse compressor gratings.optik,116(7),325. |
| MLA | Kong WJ,et al."Design and properties analysis of multi-layer dielectric used in pulse compressor gratings".optik 116.7(2005):325. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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