中国科学院机构知识库网格
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Laser induced damage of multi-layer dielectric used in pulse compressor gratings

文献类型:期刊论文

作者Weijin Kong ; Yuanan Zhao ; Tao Wang ; Shao JD(邵建达) ; Fan ZX(范正修)
刊名chin. opt. lett.
出版日期2005
卷号3期号:3页码:181
关键词140.3330 laser damage 310.6860 thin films optical properties 230.1950 diffraction gratings
ISSN号1671-7694
中文摘要laser induced damage threshold (lidt) of multi-layer dielectric used in pulse compressor gratings (pcg) was investigated. the sample was prepared by e-beam evaporation (ebe). lidt was detected following iso standard 11254-1.2. it was found that lidts of normal and 51.2 deg. incidence (transverse electric (te) mode) were 14.14 and 9.31 j/cm2, respectively. a nomarski microscope was employed to map the damage morphology, and it was found that the damage behavior was pit-concave-plat structure for normal incidence, while it was pit structure for 51.2 deg. incidence with te mode. the electric field distribution was calculated to illuminate the difference of lidt between the two incident cases.
学科主题光学薄膜
收录类别EI
语种英语
公开日期2009-09-22
源URL[http://ir.siom.ac.cn/handle/181231/4188]  
专题上海光学精密机械研究所_光学薄膜技术研究与发展中心
推荐引用方式
GB/T 7714
Weijin Kong,Yuanan Zhao,Tao Wang,et al. Laser induced damage of multi-layer dielectric used in pulse compressor gratings[J]. chin. opt. lett.,2005,3(3):181, 183.
APA Weijin Kong,Yuanan Zhao,Tao Wang,邵建达,&范正修.(2005).Laser induced damage of multi-layer dielectric used in pulse compressor gratings.chin. opt. lett.,3(3),181.
MLA Weijin Kong,et al."Laser induced damage of multi-layer dielectric used in pulse compressor gratings".chin. opt. lett. 3.3(2005):181.

入库方式: OAI收割

来源:上海光学精密机械研究所

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