Influence of negative ion element impurities on laser induced damage threshold of HfO2 thin film
文献类型：期刊论文
| 作者 | Wu ShiGang ; Tian GuangLei ; Xia ZL(夏志林) ; Shao JD(邵建达) ; Fan ZX(范正修) |
| 刊名 | appl. surf. sci.
 |
| 出版日期 | 2006 |
| 卷号 | 253期号:3页码:1111 |
| 关键词 | negative ion elements impurities breakdown model HfO2 thin film weak absorption LIDT |
| ISSN号 | 0169-4332 |
| 中文摘要 | negative ion element impurities breakdown model in hfo2 thin film was reported in this paper. the content of negative ion elements were detected by glow discharge mass spectrum analysis (gdms); hfo2 thin films were deposited by the electron-beam evaporation method. the weak absorption and laser induced damage threshold (lidt) of hfo2 thin films were measured to testify the negative ion element impurity breakdown model. it was found that the lidt would decrease and the absorption would increase with increasing the content of negative ion element. these results indicated that negative ion elements were harmful impurities and would speed up the damage of thin film. (c) 2006 elsevier b.v. all rights reserved. |
| 学科主题 | 光学薄膜 |
| 收录类别 | EI |
| 语种 | 英语 |
| WOS记录号 | WOS:000242818000012 |
| 公开日期 | 2009-09-22 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/4196]  |
| 专题 | 上海光学精密机械研究所_光学薄膜技术研究与发展中心 |
| 推荐引用方式 GB/T 7714 | Wu ShiGang,Tian GuangLei,Xia ZL,et al. Influence of negative ion element impurities on laser induced damage threshold of HfO2 thin film[J]. appl. surf. sci.,2006,253(3):1111, 1115. |
| APA | Wu ShiGang,Tian GuangLei,夏志林,邵建达,&范正修.(2006).Influence of negative ion element impurities on laser induced damage threshold of HfO2 thin film.appl. surf. sci.,253(3),1111. |
| MLA | Wu ShiGang,et al."Influence of negative ion element impurities on laser induced damage threshold of HfO2 thin film".appl. surf. sci. 253.3(2006):1111. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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