Layer uniformity of glancing angle deposition
文献类型：期刊论文
| 作者 | Wang JH ; Shao JD(邵建达) ; Yi K ; Fan ZX(范正修) |
| 刊名 | vacuum
 |
| 出版日期 | 2005 |
| 卷号 | 78期号:1页码:107 |
| 关键词 | e-beam evaporation glancing angle deposition layer uniformity |
| ISSN号 | 0042-207x |
| 中文摘要 | some results of an investigation on the layer thickness uniformity of glancing angle deposition are presented. a zirconia monolayer has been deposited by glancing angle deposition to analyze the layer thickness uniformity. the experimental results indicate that the thickness variation over the substrate is less than 0. 1%, which is considered as good uniformity. it is found that the non-uniformity of experimental results is larger than that of the theoretical results. (c) 2005 elsevier ltd. all rights reserved. |
| 学科主题 | 光学薄膜 |
| 收录类别 | EI |
| 语种 | 英语 |
| WOS记录号 | WOS:000228034000014 |
| 公开日期 | 2009-09-22 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/4240]  |
| 专题 | 上海光学精密机械研究所_光学薄膜技术研究与发展中心 |
| 推荐引用方式 GB/T 7714 | Wang JH,Shao JD,Yi K,et al. Layer uniformity of glancing angle deposition[J]. vacuum,2005,78(1):107, 111. |
| APA | Wang JH,邵建达,Yi K,&范正修.(2005).Layer uniformity of glancing angle deposition.vacuum,78(1),107. |
| MLA | Wang JH,et al."Layer uniformity of glancing angle deposition".vacuum 78.1(2005):107. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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