退火对电子束热蒸发193nm Al2O3/MgF2反射膜性能的影响
文献类型：期刊论文
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| 作者 | 尚淑珍 ; 邵建达 ; 沈健 ; 易葵 ; 范正修 |
| 刊名 | 物理学报
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| 出版日期 | 2006 |
| 卷号 | 55期号:5页码:2639 |
| 关键词 | 193nm反射膜 193nm HR mirrors 退火 annealing 光学损耗 optical loss 吸收 absorption |
| ISSN号 | 1000-3290 |
| 其他题名 | Effects of annealing on electron-beam evaporated 193nm Al2O3/MgF2 HR mirrors |
| 中文摘要 | 设计并镀制了193nm Al2O3/MgF2反射膜,对它们在空气中分别进行了250-400℃的高温退火,测量了样品的透射率光谱曲线和绝对反射率光谱曲线.发现样品在高反射区的总的光学损耗随退火温度的升高而下降,而后趋于饱和.采用总积分散射的方法对样品在不同退火温度下的散射损耗进行了分析,发现随着退火温度的升高散射损耗有所增加.因此,总的光学损耗的下降是由于吸收损耗而不是散射损耗起主导作用.对Al2O3材料的单层膜进行了同等条件的退火处理,由它们光学性能的变化推导出它们的折射率和消光系数的变化,从而解释了相应; 193nm Al2O3/MgF2 HR mirrors were designed and deposited by electron-beam evaporation, and then annealed in air at different temperatures from 250 degrees C to 400 degrees C. The center wavelength shifted to shorter wavelength after annealing. And the reflectance of HR region increased but the transmittance changed negligibly little with the increasing of the annealing temperature. The total integrated scattering was measured to distinguish the scattering loss and the absorption loss. The results indicated that the total optical loss in the HR region was absorption dominant rather than scattering dominant. To know clearly the loss-reduction mechanism of annealing, the corresponding single-layers of Al2O3 were deposited and annealed in the same way. The change of optical constants was analyzed to explain the reduction of the total optical loss. And the reflectance of the HR mirrors reached was higher than 98%. |
| 学科主题 | 光学薄膜 |
| 分类号 | O484.41;TN304.23 |
| 收录类别 | ei |
| 语种 | 中文 |
| 公开日期 | 2009-09-22 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/4332]  |
| 专题 | 上海光学精密机械研究所_光学薄膜技术研究与发展中心 |
| 推荐引用方式 GB/T 7714 | 尚淑珍,邵建达,沈健,等. 退火对电子束热蒸发193nm Al2O3/MgF2反射膜性能的影响, Effects of annealing on electron-beam evaporated 193nm Al2O3/MgF2 HR mirrors[J]. 物理学报,2006,55(5):2639, 2643. |
| APA | 尚淑珍,邵建达,沈健,易葵,&范正修.(2006).退火对电子束热蒸发193nm Al2O3/MgF2反射膜性能的影响.物理学报,55(5),2639. |
| MLA | 尚淑珍,et al."退火对电子束热蒸发193nm Al2O3/MgF2反射膜性能的影响".物理学报 55.5(2006):2639. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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