电子束蒸发氧化锆薄膜的粗糙度和光散射特性
文献类型：期刊论文
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| 作者 | 侯海虹 ; 孙喜莲 ; 申雁鸣 ; 邵建达 ; 范正修 ; 易葵 |
| 刊名 | 物理学报
 |
| 出版日期 | 2006 |
| 卷号 | 55期号:6页码:3124 |
| 关键词 | 氧化锆 ZiO(2) coatings 表面粗糙度 surface roughness 标量散射 scalar scattering 电子束蒸发 electron beam evaporation |
| ISSN号 | 1000-3290 |
| 其他题名 | Roughness and light scattering properties of ZrO2 thin films deposited by electron beam evaporation |
| 中文摘要 | 利用电子束蒸发工艺，以Ag层为衬底，沉积了中心波长为632．8nm的氧化锆（ZrO2）薄膜，膜层厚度在80-480nm范围内变化．研究了不同厚度样品的粗糙度变化规律和表面散射特性．结果发现，随着膜层厚度的逐渐增加．其表面均方根（RMS）粗糙度和总积分散射（TIS）均呈现出先减小后增大的趋势．利用非相关表面粗糙度的散射模型对样品的TIS特性进行了理论计算，所得结果与测量结果相一致．; Zirconium oxide ( ZrO2) coatings for 632.8nm center wavelength were deposited on the Ag layer by electron beam evaporation, optical thickness of which varied in the range of 80-480nm. Surface roughness and scattering characteristics of ZrO2 coatings with different thickness were investigated. It was found that with the gradually increase of the thickness, both roughness and total integrated scattering (TIS) of the samples decreased firstly and then increased. These results indicated that TIS of the samples mainly depended on the surface roughness. According to the uncorrelated surface roughness scattering model, scattering properties of the samples were analyzed theoretically. The calculated TIS values based on this model agreed well with that obtained by TIS measurements. |
| 学科主题 | 光学薄膜 |
| 分类号 | TN011;TG84 |
| 收录类别 | ei |
| 语种 | 中文 |
| 公开日期 | 2009-09-22 ; 2010-10-12 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/4346]  |
| 专题 | 上海光学精密机械研究所_光学薄膜技术研究与发展中心 |
| 推荐引用方式 GB/T 7714 | 侯海虹,孙喜莲,申雁鸣,等. 电子束蒸发氧化锆薄膜的粗糙度和光散射特性, Roughness and light scattering properties of ZrO2 thin films deposited by electron beam evaporation[J]. 物理学报,2006,55(6):3124, 3127. |
| APA | 侯海虹,孙喜莲,申雁鸣,邵建达,范正修,&易葵.(2006).电子束蒸发氧化锆薄膜的粗糙度和光散射特性.物理学报,55(6),3124. |
| MLA | 侯海虹,et al."电子束蒸发氧化锆薄膜的粗糙度和光散射特性".物理学报 55.6(2006):3124. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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