中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
不同沉积参量下ZrO_2薄膜的微结构和激光损伤阈值

文献类型:期刊论文

作者马平 ; 陈松林 ; 胡建平 ; 胡江川 ; 段立华 ; 王震 ; 邵建达 ; 范正修
刊名光学学报
出版日期2005
卷号25期号:7页码:994
关键词薄膜光学 ZrO2薄膜 X射线衍射 氧压 基体温度 激光损伤 thin film optics ZrO2 thin film X-ray diffraction oxygen partial pressure substrate temperature laser damage
ISSN号0253-2239
其他题名Studies on the micro-structure and laser damage threshold of ZrO2 thin films deposited at different parameters
中文摘要ZrO2采用X射线衍射(XRD)技术分析了不同充氧条件和沉积温度对ZrO2溥膜组成结构的影响,并对不同工艺下制备的薄膜的表面粗糙度和激光损伤阈值进行了测量。结果发现随着氧压的升高,ZrO2溥膜将由单斜相多晶态逐渐转变为非晶态结构,而随着基片温度的增加,溥膜将由非晶态逐渐转变为单斜相多晶态。同时发现随着氧压升高晶粒尺寸减小,而随着沉积温度增加,晶粒尺寸增大。氧压增加时工艺对表面粗糙度有一定程度的改善,而沉积温度升高,工艺对表面粗糙度的改善不明显。晶粒尺寸大小变化与表面粗糙度变化存在对应关系。激光损伤测量表明; ZrO2 is an important material used in high laser damage coatings. Influence on the microstructure of ZrO2 thin films deposited at different O2 partial pressure and substrate temperature was analysed by X-ray diffraction (XRD) technique, the surface roughness and laser damage threshold also were measured. The results showed that morphology transition from polycrystalline to amorphism occurred with O2 pressure increaed while from amorphism to polycrystalline occurred with substrate temperature increased. Simultaneously, it was found that the grain size was reduced with the increased O2 pressure but increased with the increasing substrate temperature. The surface roughness was improved with increasing O2 pressure but has little change with substrate temperature increased. The change of grain size have some relationship with the surface roughness. The damage results indicated that O2 pressure and substrate temperature can influence the laser damage threshold of ZrO2 thin films.
学科主题光学薄膜
分类号O484.4
收录类别ei
语种中文
公开日期2009-09-22
源URL[http://ir.siom.ac.cn/handle/181231/4394]  
专题上海光学精密机械研究所_光学薄膜技术研究与发展中心
推荐引用方式
GB/T 7714
马平,陈松林,胡建平,等. 不同沉积参量下ZrO_2薄膜的微结构和激光损伤阈值[J]. 光学学报,2005,25(7):994, 998.
APA 马平.,陈松林.,胡建平.,胡江川.,段立华.,...&范正修.(2005).不同沉积参量下ZrO_2薄膜的微结构和激光损伤阈值.光学学报,25(7),994.
MLA 马平,et al."不同沉积参量下ZrO_2薄膜的微结构和激光损伤阈值".光学学报 25.7(2005):994.

入库方式: OAI收割

来源:上海光学精密机械研究所

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