中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
High-reflectance 193 nm Al2O3/MgF2 mirrors

文献类型:期刊论文

作者Shang SZ ; Shao JD(邵建达) ; Liao CY ; Yi K ; Fan ZX(范正修) ; Chen L
刊名appl. surf. sci.
出版日期2005
卷号249期号:1~4页码:157
关键词optical coatings 193 nm HR mirrors Al2O3 MgF2
ISSN号0169-4332
中文摘要thin-film single layers of al2o3 and mgf2 were deposited upon super polished fused-silica by electron-beam evaporation. the subsequent optical constants n and k were reported for the spectral range of 180-230 nm. high-reflectance dense multilayer coatings for 193 nm were designed on the basis of the evaluated optical constants and produced. the spectra of the reflectance of hr coatings were compared to the theoretical calculations. hr mirrors of 27 layers with a reflectance of more than 98% were reported. (c) 2004 elsevier b.v. all rights reserved.
学科主题光学薄膜
收录类别EI
语种英语
WOS记录号WOS:000230607800023
公开日期2009-09-22
源URL[http://ir.siom.ac.cn/handle/181231/4436]  
专题上海光学精密机械研究所_光学薄膜技术研究与发展中心
推荐引用方式
GB/T 7714
Shang SZ,Shao JD,Liao CY,et al. High-reflectance 193 nm Al2O3/MgF2 mirrors[J]. appl. surf. sci.,2005,249(1~4):157, 161.
APA Shang SZ,邵建达,Liao CY,Yi K,范正修,&Chen L.(2005).High-reflectance 193 nm Al2O3/MgF2 mirrors.appl. surf. sci.,249(1~4),157.
MLA Shang SZ,et al."High-reflectance 193 nm Al2O3/MgF2 mirrors".appl. surf. sci. 249.1~4(2005):157.

入库方式: OAI收割

来源:上海光学精密机械研究所

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