High-reflectance 193 nm Al2O3/MgF2 mirrors
文献类型：期刊论文
| 作者 | Shang SZ ; Shao JD(邵建达) ; Liao CY ; Yi K ; Fan ZX(范正修) ; Chen L |
| 刊名 | appl. surf. sci.
 |
| 出版日期 | 2005 |
| 卷号 | 249期号:1~4页码:157 |
| 关键词 | optical coatings 193 nm HR mirrors Al2O3 MgF2 |
| ISSN号 | 0169-4332 |
| 中文摘要 | thin-film single layers of al2o3 and mgf2 were deposited upon super polished fused-silica by electron-beam evaporation. the subsequent optical constants n and k were reported for the spectral range of 180-230 nm. high-reflectance dense multilayer coatings for 193 nm were designed on the basis of the evaluated optical constants and produced. the spectra of the reflectance of hr coatings were compared to the theoretical calculations. hr mirrors of 27 layers with a reflectance of more than 98% were reported. (c) 2004 elsevier b.v. all rights reserved. |
| 学科主题 | 光学薄膜 |
| 收录类别 | EI |
| 语种 | 英语 |
| WOS记录号 | WOS:000230607800023 |
| 公开日期 | 2009-09-22 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/4436]  |
| 专题 | 上海光学精密机械研究所_光学薄膜技术研究与发展中心 |
| 推荐引用方式 GB/T 7714 | Shang SZ,Shao JD,Liao CY,et al. High-reflectance 193 nm Al2O3/MgF2 mirrors[J]. appl. surf. sci.,2005,249(1~4):157, 161. |
| APA | Shang SZ,邵建达,Liao CY,Yi K,范正修,&Chen L.(2005).High-reflectance 193 nm Al2O3/MgF2 mirrors.appl. surf. sci.,249(1~4),157. |
| MLA | Shang SZ,et al."High-reflectance 193 nm Al2O3/MgF2 mirrors".appl. surf. sci. 249.1~4(2005):157. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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